scholarly journals Unconventional, Laser Based OLED Material Direct Patterning and Transfer Methods

Author(s):  
Seung Hwan ◽  
Costas P.
Keyword(s):  
2010 ◽  
Vol 48 (2) ◽  
pp. 163-168 ◽  
Author(s):  
Hyunkwon Shin ◽  
Hyeongjae Lee ◽  
Hyeongjae Yoo ◽  
Ki-Soo Lim ◽  
Myeongkyu Lee

1995 ◽  
Vol 380 ◽  
Author(s):  
Craig T. Salling

ABSTRACTThe ability to create atomic-scale structures with the scanning tunneling microscope (STM) plays an important role in the development of a future nanoscale technology. I briefly review the various modes of STM-based fabrication and atomic manipulation. I focus on using a UHV-STM to directly pattern the Si(001) surface by atomic manipulation at room temperature. By carefully adjusting the tip morphology and pulse voltage, a single atomic layer can be removed from the sample surface to define features one atom deep. Segments of individual dimer rows can be removed to create structures with atomically straight edges and with lateral features as small as one dimer wide. Trenches ∼3 nm wide and 2–3 atomic layers deep can be created with less stringent control of patterning parameters. Direct patterning provides a straightforward route to the fabrication of nanoscale test structures under UHV conditions of cleanliness.


Author(s):  
Petr Dzik ◽  
Magdalena Morozová ◽  
Petr Klusoň ◽  
Michal Veselý

AbstractAn optimized reverse micelles sol-gel composition was deposited by inkjet direct patterning onto glass supports. Experimental “material printer” Fujifilm Dimatix 2831 was used for sol patterning. Printing was repeated up to 4 times in wet-to-dry manner and photocatalytic coatings of various thickness were obtained after final thermal calcination. Basic material properties of prepared coating were studied by optical microscopy, electron and atomic force imaging, Raman, XRD and UV-VIS spectrometry. Photocatalytic activity was evaluated by dye and fatty acid degradation rate as well as photoinduced hydrophilic conversion rate. Reverse micelles proved to be viable synthetic route for the preparation of titania coatings with even structure and their compatibility with inkjet direct patterning deposition was demonstrated.


2007 ◽  
Vol 19 (21) ◽  
pp. 3513-3516 ◽  
Author(s):  
C. M. Hessel ◽  
M. A. Summers ◽  
A. Meldrum ◽  
M. Malac ◽  
J. G. C. Veinot

2014 ◽  
Vol 26 (18) ◽  
pp. 2782-2787 ◽  
Author(s):  
SooHyun Park ◽  
Guang Yang ◽  
Nrutya Madduri ◽  
Mohammad Reza Abidian ◽  
Sheereen Majd

2009 ◽  
Vol 86 (4-6) ◽  
pp. 882-884 ◽  
Author(s):  
D. Lucot ◽  
J. Gierak ◽  
A. Ouerghi ◽  
E. Bourhis ◽  
G. Faini ◽  
...  
Keyword(s):  

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