scholarly journals A pulse-counting mass spectrometer system with a miniturized extraction furnace for noble gas isotopes.

1989 ◽  
Vol 37 (6) ◽  
pp. 391-410
Author(s):  
Yasuji Oura ◽  
Yasunori Hamajima ◽  
Koh Sakamoto
1986 ◽  
Vol 75 ◽  
Author(s):  
Harold F. Winters ◽  
D. Haarer

AbstractIt has been recognized for some time that the doping level in silicon influences etch rate in plasma environments[1–8]. We have now been able to reproduce and investigate these doping effects in a modulated-beam, mass spectrometer system described previously [9] using XeF2 as the etchant gas. The phenomena which have been observed in plasma reactors containing fluorine atoms are also observed in our experiments. The data has led to a model which explains the major trends.


Author(s):  
Shuai WANG ◽  
Jian KUANG ◽  
Xuelian HUANG ◽  
Hongyan ZHANG ◽  
Min ZHANG ◽  
...  

Tellus B ◽  
2004 ◽  
Vol 56 (4) ◽  
pp. 322-338 ◽  
Author(s):  
RALPH F. KEELING ◽  
TEGAN BLAINE ◽  
BILL PAPLAWSKY ◽  
LAURA KATZ ◽  
CHRIS ATWOOD ◽  
...  

2002 ◽  
Vol 73 (2) ◽  
pp. 446-452 ◽  
Author(s):  
J. Schreiner ◽  
C. Voigt ◽  
P. Zink ◽  
A. Kohlmann ◽  
D. Knopf ◽  
...  

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