scholarly journals Flutter Suppression of Cantilevered Plate Wing using Piezoelectric Materials

2006 ◽  
Vol 7 (2) ◽  
pp. 70-85 ◽  
Author(s):  
Kanjuro Makihara ◽  
Junjiro Onoda ◽  
Kenji Minesugi
2018 ◽  
Vol 140 (6) ◽  
Author(s):  
Zhi-Guang Song ◽  
Tian-Zhi Yang ◽  
Feng-Ming Li ◽  
Erasmo Carrera ◽  
Peter Hagedorn

In traditional active flutter control, piezoelectric materials are used to increase the stiffness of the aeroelastic structure by providing an active stiffness, and usually the active stiffness matrix is symmetric. That is to say that the active stiffness not only cannot offset the influence of the aerodynamic stiffness which is an asymmetric matrix, but also will affect the natural frequency of the structural system. In other words, by traditional active flutter control method, the flutter bound can just be moved backward but cannot be eliminated. In this investigation, a new active flutter control method which can suppress the flutter effectively and without affecting the natural frequency of the structural system is proposed by exerting active control forces on some discrete points of the structure. In the structural modeling, the Kirchhoff plate theory and supersonic piston theory are applied. From the numerical results, it can be noted that the present control method is effective on the flutter suppression, and the control effects will be better if more active control forces are exerted. After being controlled by the present control method, the natural frequency of the structure remains unchanged.


Author(s):  
T. A. Emma ◽  
M. P. Singh

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.


2012 ◽  
Vol 2 (5) ◽  
pp. 252-255
Author(s):  
Rudresha K J Rudresha K J ◽  
◽  
Girisha G K Girisha G K

Author(s):  
Flávio Silvestre ◽  
Mauricio Donadon ◽  
Osmar de Sousa Santos ◽  
Antônio Bernardo Guimarães Neto ◽  
ROBERTO GIL ANNES DA SILVA ◽  
...  

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