scholarly journals PRECISION DOUBLET OF MAGNETIC QUADRUPOLE LENSES FOR ION BEAM FORMATION

2020 ◽  
pp. 45-48
Author(s):  
A.G. Ponomarev ◽  
V.A. Rebrov ◽  
S.V. Kolinko ◽  
V.F. Salivon
Keyword(s):  
Magnetic Induction ◽  
Ion Beam ◽  
Reconstruction Technique ◽  
Soft Magnetic ◽  
Field Reconstruction ◽  
Single Piece ◽  
Magnetic Quadrupole ◽  
Beam Formation ◽  
Multipole Field ◽  
Quadrupole Lenses

The precision doublet of magnetic quadrupole lenses is presented. The doublet yoke and poles made from a single piece of soft magnetic iron. Doublet manufacturing technology provides of alignment of the geometric axes in the lenses with an accuracy of a few microns. The doublet geometry was chosen to obtain the maximum magnetic induction at the poles for a given radius of the lens aperture as a result of numerical simulation. An experimental study of the doublet properties was carried out using a setup for field reconstruction technique for magnetic quadrupole lenses. The relative position of the physical axes of the lenses (the geometrical location of points with zero magnetic induction) and the magnitudes of the parasitic multipole field components were determined.

Ion beam image transformation using magnetic quadrupole lenses

1978 ◽  
Vol 151 (1-2) ◽  
pp. 47-52
Author(s):  
Katsumi Tokiguchi ◽  
Noriyuki Sakudo ◽  
Shunroku Taya ◽  
Hidemi Koike ◽  
Ichiro Kanomata
Keyword(s):  
Ion Beam ◽  
Image Transformation ◽  
Beam Image ◽  
Magnetic Quadrupole ◽  
Quadrupole Lenses

Optimizing Gas-Assisted Processes for Ga and Xe FIB Circuit Edit Application

2016 ◽  
Author(s):  
Valery Ray ◽  
Josef V. Oboňa ◽  
Sharang Sharang ◽  
Lolita Rotkina ◽  
Eddie Chang ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Structural Damage ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Width ◽  
Ion Source ◽  
Reconstruction Technique ◽  
Beam Diameter ◽  
Current Profile ◽  
Single Beam

Abstract Despite commercial availability of a number of gas-enhanced chemical etches for faster removal of the material, there is still lack of understanding about how to take into account ion implantation and the structural damage by the primary ion beam during focused ion beam gas-assisted etching (FIB GAE). This paper describes the attempt to apply simplified beam reconstruction technique to characterize FIB GAE within single beam width and to evaluate the parameters critical for editing features with the dimensions close to the effective ion beam diameter. The approach is based on reverse-simulation methodology of ion beam current profile reconstruction. Enhancement of silicon dioxide etching with xenon difluoride precursor in xenon FIB with inductively coupled plasma ion source appears to be high and relatively uniform over the cross-section of the xenon beam, making xenon FIB potentially suitable platform for selective removal of materials in circuit edit application.

Studies of Heavy Ion Beam Transport in a Magnetic Quadrupole Channel

1983 ◽  
Vol 30 (4) ◽  
pp. 2543-2545 ◽  
Author(s):  
J. Klabunde ◽  
M. Reiser ◽  
A. Schonlein ◽  
P. Spadtke ◽  
J. Struckmeier
Keyword(s):  
Ion Beam ◽  
Heavy Ion ◽  
Beam Transport ◽  
Magnetic Quadrupole ◽  
Heavy Ion Beam

Compact magnetic quadrupole triplet for a low-energy high-current ion beam transport

2008 ◽  
Vol 79 (2) ◽  
pp. 02B715
Author(s):  
Yong-Sub Cho ◽  
Han-Sung Kim ◽  
Hyeok-Jung Kwon
Keyword(s):  
Ion Beam ◽  
Low Energy ◽  
High Current ◽  
Beam Transport ◽  
Magnetic Quadrupole
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