Coating, Titanium Nitride, Physical Vapor Deposition

Low‐temperature processing of titanium nitride films by laser physical vapor deposition

Applied Physics Letters ◽

10.1063/1.101338 ◽

1989 ◽

Vol 54 (16) ◽

pp. 1519-1521 ◽

Cited By ~ 51

Author(s):

N. Biunno ◽

J. Narayan ◽

S. K. Hofmeister ◽

A. R. Srivatsa ◽

R. K. Singh

Keyword(s):

Low Temperature ◽

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Low Temperature Processing

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Development of Titanium Nitride Coatings in Titanium Alloys by Electron Beam Physical Vapor Deposition

10.4271/2008-36-0016 ◽

2008 ◽

Cited By ~ 3

Author(s):

Vinicius André Rodrigues Henriques ◽

Carlos Alberto Alves Cairo ◽

Eduardo Tavares Galvani

Keyword(s):

Electron Beam ◽

Titanium Nitride ◽

Titanium Alloys ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Nitride Coatings

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Proton exchange membrane (PEM) fuel cell bipolar plates prepared from a physical vapor deposition (PVD) titanium nitride (TiN) coated AISI416 stainless-steel

SN Applied Sciences ◽

10.1007/s42452-019-1475-3 ◽

2019 ◽

Vol 1 (11) ◽

Cited By ~ 3

Author(s):

Tomer Stein ◽

Yair Ein-Eli

Keyword(s):

Stainless Steel ◽

Fuel Cell ◽

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Proton Exchange Membrane ◽

Pem Fuel Cell ◽

Proton Exchange ◽

Bipolar Plates ◽

Exchange Membrane

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Physical Vapor Deposition of Metals: Physical Vapor Deposition of Titanium Nitride for Surface Protection

10.4271/ams03_28pt3a ◽

2017 ◽

Author(s):

Keyword(s):

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Surface Protection

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Physical Vapor Deposition of Metals: Physical Vapor Deposition of Titanium Nitride for Surface Protection

10.4271/ams03_28pt3 ◽

2015 ◽

Author(s):

Keyword(s):

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Surface Protection

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Ionized physical vapor deposition of titanium nitride: A global plasma model

Journal of Applied Physics ◽

10.1063/1.1455139 ◽

2002 ◽

Vol 91 (7) ◽

pp. 4040-4048 ◽

Cited By ~ 60

Author(s):

K. Tao ◽

D. Mao ◽

J. Hopwood

Keyword(s):

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Plasma Model ◽

Ionized Physical Vapor Deposition

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Titanium nitride thin films obtained by a modified physical vapor deposition process

Thin Solid Films ◽

10.1016/s0040-6090(00)01192-5 ◽

2000 ◽

Vol 376 (1-2) ◽

pp. 9-15 ◽

Cited By ~ 44

Author(s):

P LeClair ◽

G.P Berera ◽

J.S Moodera

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Deposition Process ◽

Physical Vapor Deposition Process ◽

Vapor Deposition Process

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Inductively coupled plasma assisted physical vapor deposition of titanium nitride coatings

Journal of Electronic Materials ◽

10.1007/s11664-997-0074-z ◽

1997 ◽

Vol 26 (11) ◽

pp. 1297-1302 ◽

Cited By ~ 33

Author(s):

W. J. Meng ◽

T. J. Curtis

Keyword(s):

Titanium Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Physical Vapor Deposition ◽

Inductively Coupled ◽

Nitride Coatings

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Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor deposition

Materials Research ◽

10.1590/s1516-14392001000300004 ◽

2001 ◽

Vol 4 (3) ◽

pp. 163-168 ◽

Cited By ~ 4

Author(s):

M.J. Carbonari ◽

J.R. Martinelli

Keyword(s):

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition

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Ionized physical vapor deposition of titanium nitride: Plasma and film characterization

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1446448 ◽

2002 ◽

Vol 20 (2) ◽

pp. 379-387 ◽

Cited By ~ 33

Author(s):

D. Mao ◽

K. Tao ◽

J. Hopwood

Keyword(s):

Titanium Nitride ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Ionized Physical Vapor Deposition

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