A New Technique to Detect and Control Knock Damage

1982 ◽  
Author(s):  
François Renault
1987 ◽  
Vol 65 (8) ◽  
pp. 1027-1029 ◽  
Author(s):  
G. Perluzzo ◽  
C. Aktik ◽  
J. F. Currie ◽  
S. Poulin-Dandurand ◽  
A. Yelon ◽  
...  

We report here on the further development of a new technique for doping plasma-deposited amorphous silicon by thermal evaporation of metal into the plasma from which the film is grown. We show that the de bias applied to the substrate has an important effect on the incorporation of the metal into the film, and on the doping efficiency. We also report on our efforts to monitor and control the evaporation by mass spectroscopy.


2001 ◽  
Vol 16 (1) ◽  
pp. 43-48 ◽  
Author(s):  
Peter Schneede ◽  
Dominic Frimberger ◽  
Dirk Zaak ◽  
Alfons Hofstetter

2005 ◽  
Vol 25 (1_suppl) ◽  
pp. S543-S543
Author(s):  
Satoshi Kimura ◽  
Keigo Matsumoto ◽  
Yoshio Imahori ◽  
Katsuyoshi Mineura ◽  
Toshiyuki Itoh

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