Trace Contaminant Removal by Atmospheric Pressure Plasma Discharges

2008 ◽  
Author(s):  
Yonghui Ma ◽  
Andrew North
2021 ◽  
Vol 11 (2) ◽  
pp. 662
Author(s):  
Judit Buxadera-Palomero ◽  
Katja Fricke ◽  
Stephan Reuter ◽  
Francisco Javier Gil ◽  
Daniel Rodriguez ◽  
...  

Dental implants can fail due to various factors, in which bad tissue integration is believed to have a significant role. Specific properties of the implant surface, such as its chemistry and roughness, are of paramount importance to address specific cell responses, such as the adsorption of proteins, as well as the adhesion and differentiation of cells, which are suitable for biomaterial and tissue engineering. In this study, an acrylate-containing coating was produced on titanium surfaces through the atmospheric pressure plasma treatment of a liquid precursor, 2-hydroxyethyl methacrylate. A hydrophilic coating was obtained, showing retention of the monomer chemistry as assessed by FTIR analysis and XPS. Enhanced fibroblast adhesion and decreased Staphylococcus aureus and Escherichia coli adhesion were recorded, showing that this is a suitable method to produce biocompatible coatings with a reduced bacterial adhesion.


PIERS Online ◽  
2010 ◽  
Vol 6 (7) ◽  
pp. 636-639
Author(s):  
Toshiyuki Nakamiya ◽  
Fumiaki Mitsugi ◽  
Shota Suyama ◽  
Tomoaki Ikegami ◽  
Yoshito Sonoda ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.


2018 ◽  
Vol 677 (1) ◽  
pp. 135-142
Author(s):  
Dong Ha Kim ◽  
Choon-Sang Park ◽  
Eun Young Jung ◽  
Bhum Jae Shin ◽  
Jae Young Kim ◽  
...  

Author(s):  
Thisara Sandanuwan ◽  
Nayanathara Hendeniya ◽  
D.A.S. Amarasinghe ◽  
Dinesh Attygalle ◽  
Sampath Weragoda

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