scholarly journals Microstructure and 355 nm Laser-Induced Damage Characteristics of Al<sub>2</sub>O<sub>3</sub> Films Irradiated with Oxygen Plasma under Different Energy

2013 ◽  
Vol 03 (02) ◽  
pp. 152-157 ◽  
Author(s):  
Dongping Zhang ◽  
Yan Li ◽  
Jingting Luo ◽  
Zhuanghao Zheng ◽  
Guangxing Liang ◽  
...  
Keyword(s):  
Oxygen Plasma ◽  
Damage Characteristics ◽  
Laser Induced Damage

Interrelation of the laser-induced damage characteristics in statistical theory

2000 ◽  
Vol 30 (7) ◽  
pp. 592-596
Author(s):  
M F Koldunov ◽  
Aleksandr A Manenkov ◽  
I L Pokotilo
Keyword(s):  
Statistical Theory ◽  
Damage Characteristics ◽  
Laser Induced Damage

Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film

2019 ◽  
Vol 12 (2) ◽  
pp. 371-381
Author(s):  
郑长彬 ZHENG Chang-bin ◽  
邵俊峰 SHAO Jun-feng ◽  
李雪雷 LI Xue-lei ◽  
王化龙 WANG Hua-long ◽  
王春锐 WANG Chun-rui ◽  
...  
Keyword(s):  
Pulsed Laser ◽  
Layer Film ◽  
Damage Characteristics ◽  
Laser Induced Damage ◽  
Multi Layer Film ◽  
Femtosecond Pulsed Laser

Erratum: Interrelation of the laser-induced damage characteristics in statistical theory

2000 ◽  
Vol 30 (10) ◽  
pp. 940-940
Author(s):  
M F Koldunov ◽  
Aleksandr A Manenkov ◽  
I L Pokotilo
Keyword(s):  
Statistical Theory ◽  
Damage Characteristics ◽  
Laser Induced Damage

Femtosecond laser-induced damage characteristics of mid-infrared oxyfluorogallate glass

2019 ◽  
Vol 109 ◽  
pp. 659-665 ◽  
Author(s):  
Qisong Li ◽  
Xinqiang Yuan ◽  
Xiongwei Jiang ◽  
Yongfeng Ju ◽  
Long Zhang
Keyword(s):  
Femtosecond Laser ◽  
Mid Infrared ◽  
Damage Characteristics ◽  
Laser Induced Damage

Laser induced damage characteristics of fused silica optics treated by wet chemical processes

2015 ◽  
Vol 357 ◽  
pp. 498-505 ◽  
Author(s):  
Hui Ye ◽  
Yaguo Li ◽  
Zhigang Yuan ◽  
Jian Wang ◽  
Wei Yang ◽  
...  
Keyword(s):  
Fused Silica ◽  
Chemical Processes ◽  
Damage Characteristics ◽  
Wet Chemical ◽  
Laser Induced Damage

UHV-TEM studies of laser-induced damage

1991 ◽  
Vol 49 ◽  
pp. 632-633
Author(s):  
T.S. Savage ◽  
R. Ai ◽  
D. Dunn ◽  
L.D. Marks
Keyword(s):  
Surface Science ◽  
Rapid Heating ◽  
Local Heating ◽  
Routine Practice ◽  
Transmission Electron ◽  
Northwestern University ◽  
Laser Induced Damage ◽  
Set Up ◽  
Focusing Lens ◽  
Diffusion Of Impurities

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.

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