scholarly journals Electrochemical and Photoelectrochemical Properties of Nano-Islands of Zinc and Niobium Oxides Deposited on Aluminum Thin Film by RF Magnetron Reactive Sputtering

2015 ◽  
Vol 06 (04) ◽  
pp. 292-309 ◽  
Author(s):  
Go Sajiki ◽  
Yasuhiko Benino ◽  
Tokuro Nanba ◽  
Hiroshi Okano
Keyword(s):  
Thin Film ◽  
Reactive Sputtering ◽  
Photoelectrochemical Properties ◽  
Niobium Oxides ◽  
Aluminum Thin Film

Photocatalytic and photoelectrochemical properties of TiO2-based multiple layer thin film prepared by sol–gel and reactive-sputtering methods

2001 ◽  
Vol 11 (4) ◽  
pp. 1253-1257 ◽  
Author(s):  
Atsuo Yasumori ◽  
Hiroyuki Shinoda ◽  
Yoshikazu Kameshima ◽  
Shigeo Hayashi ◽  
Kiyoshi Okada
Keyword(s):  
Thin Film ◽  
Sol Gel ◽  
Reactive Sputtering ◽  
Photoelectrochemical Properties ◽  
Multiple Layer ◽  
Layer Thin Film

Synthesis and properties of hydrogenated aluminum thin film by reactive sputtering

2020 ◽  
Vol 709 ◽  
pp. 138217
Author(s):  
A.P. Baraban ◽  
M.A. Dobrotvorskii ◽  
D.I. Elets ◽  
I.E. Gabis ◽  
V.G. Kuznetsov ◽  
...  
Keyword(s):  
Thin Film ◽  
Reactive Sputtering ◽  
Aluminum Thin Film

Transparency Improvement of SiCO Thin Film for Optical Waveguide with Reactive Sputtering Method

2020 ◽  
Vol 140 (12) ◽  
pp. 369-373
Author(s):  
Hiroyuki Nikkuni ◽  
Chizuru Numata ◽  
Ryoto Yamaji ◽  
Hiroshi Ito ◽  
Yoshio Kawamata
Keyword(s):  
Thin Film ◽  
Optical Waveguide ◽  
Reactive Sputtering

Graphene-Coated Aluminum Thin Film Anodes for Lithium-Ion Batteries

2018 ◽  
Vol 10 (35) ◽  
pp. 29486-29495 ◽  
Author(s):  
Gi Duk Kwon ◽  
Eric Moyen ◽  
Yeo Jin Lee ◽  
Jemee Joe ◽  
Didier Pribat
Keyword(s):  
Thin Film ◽  
Lithium Ion Batteries ◽  
Lithium Ion ◽  
Aluminum Thin Film

Thermal conductivity of ZnO thin film produced by reactive sputtering

2012 ◽  
Vol 111 (8) ◽  
pp. 084320 ◽  
Author(s):  
Yibin Xu ◽  
Masahiro Goto ◽  
Ryozo Kato ◽  
Yoshihisa Tanaka ◽  
Yutaka Kagawa
Keyword(s):  
Thin Film ◽  
Thermal Conductivity ◽  
Reactive Sputtering ◽  
Zno Thin Film

Reactive Sputtering Technique for Kesterite and Chalcogenide Based Thin Film Solar Cells

2018 ◽  
Vol 18 (11) ◽  
pp. 7670-7681
Author(s):  
Om Pal Singh ◽  
Kuldeep Singh Gour ◽  
Rahul Parmar ◽  
Vidya Nand Singh
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Reactive Sputtering ◽  
Thin Film Solar Cells

Aluminum thin film growth by the thermal decomposition of triethylamine alane

1991 ◽  
Vol 244 (1-2) ◽  
pp. 89-95 ◽  
Author(s):  
Lawrence H Dubois ◽  
Bernard R Zegarski ◽  
Mihal E Gross ◽  
Ralph G Nuzzo
Keyword(s):  
Thin Film ◽  
Thermal Decomposition ◽  
Film Growth ◽  
Thin Film Growth ◽  
Aluminum Thin Film

Palladium and Aluminum Thin Film Deposition on Thermally Sensitive Substrates From Organometallic Complexes

1992 ◽  
pp. 65-72
Author(s):  
Saswati Datta ◽  
Yoon-Gi Kim ◽  
P. A. Dowben ◽  
John A. Glass ◽  
Shreyas S. Kher ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Organometallic Complexes ◽  
Aluminum Thin Film

scholarly journals Effects of Growth Temperature on the Physicochemical and Photoelectrochemical Properties of a Modified Chemical Bath Deposited Fe2O3 Photoelectrode

2020 ◽  
Vol 58 (4) ◽  
pp. 263-271
Author(s):  
Yaejin Hong ◽  
Seung-Hwan Jeon ◽  
Hyukhyun Ryu ◽  
Won-Jae Lee
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Growth Temperature ◽  
Electrochemical Impedance ◽  
Ph Value ◽  
Saturated Calomel Electrode ◽  
Precursor Solution ◽  
Photocurrent Density ◽  
Flat Band ◽  
Photoelectrochemical Properties

In this study, Fe2O3 photoelectrode thin films were grown on fluorine-doped tin oxide substrates at various temperatures ranging from 145 to 220 oC using modified chemical bath deposition. The morphological, structural, electrical, and photoelectrochemical properties of the resulting Fe2O3 photoelectrode were analyzed using field emission scanning electron microscopy, X-ray diffraction, electrochemical impedance spectroscopy, and a three-electrode potentiostat/galvanostat, respectively. Growth temperature and hydrochloric acid etching both affected the growth of the Fe2O3 photoelectrode, with Fe2O3 thin film thickness first increasing and then decreasing as growth temperature increased. The pH value of the precursor solution varied according to growth temperature, which in turn affected film thickness. The highest photocurrent density (0.53 mA/cm2 at 0.5 V vs. saturated calomel electrode) was obtained from the Fe2O3 photoelectrode grown at 190 oC, which yielded the thickest thin film, smallest full width at half maximum and largest grain size for the (104) and (110) plane, and highest flat-band potential value. Based on these findings, the photoelectrochemical properties of Fe2O3 photoelectrodes grown at various temperatures are strongly affected by their morphological, structural, and electrical properties.

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