scholarly journals Low-Temperature Processing of PZT-PMN Thin Film by Sol-Gel Casting

2005 ◽  
Vol 42 (6) ◽  
pp. 396-400
Author(s):  
Tomoya Ohno ◽  
Hisao Suzuki ◽  
Masayoshi Fuji ◽  
Toshitaka Ota ◽  
Minoru Takahashi
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Sol Gel ◽  
Gel Casting ◽  
Low Temperature Processing

Low-temperature processing of pb{(Mgl/3Nb2/3)0.9Ti0.1}O3thin film by sol-gel-casting

1999 ◽  
Vol 231 (1) ◽  
pp. 231-236
Author(s):  
Hisao Suzuki ◽  
Hirohisa Masui ◽  
Toshitaka Ota ◽  
Minoru Takahashi
Keyword(s):  
Low Temperature ◽  
Sol Gel ◽  
Gel Casting ◽  
Low Temperature Processing

Low-Temperature Processing of Pb(Zr0.53,Ti0.43)O3Thin Films by Sol-Gel Casting

2000 ◽  
Vol 39 (Part 1, No. 9B) ◽  
pp. 5429-5433 ◽  
Author(s):  
Tomoya Ohno ◽  
Masahumi Kunieda ◽  
Hisao Suzuki ◽  
Takashi Hayashi
Keyword(s):  
Low Temperature ◽  
Sol Gel ◽  
Gel Casting ◽  
Low Temperature Processing

Low temperature processing of sol-gel derived PLZT thin film

1999 ◽  
Vol 231 (1) ◽  
pp. 211-216 ◽  
Author(s):  
Tomio Hirano ◽  
Hiroki Kawai ◽  
Hisao Suzuki ◽  
Shoji Kaneko ◽  
Tatsuya Wada
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Sol Gel ◽  
Low Temperature Processing ◽  
Plzt Thin Film

scholarly journals Sol–Gel PMMA–ZrO2 Hybrid Layers as Gate Dielectric for Low-Temperature ZnO-Based Thin-Film Transistors

ACS Omega ◽  
2017 ◽  
Vol 2 (10) ◽  
pp. 6968-6974 ◽  
Author(s):  
Clemente G. Alvarado-Beltrán ◽  
Jorge L. Almaral-Sánchez ◽  
Israel Mejia ◽  
Manuel A. Quevedo-López ◽  
Rafael Ramirez-Bon
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Thin Film Transistors ◽  
Gate Dielectric ◽  
Sol Gel ◽  
Hybrid Layers

Cross-linked poly(hydroxy imide) gate-insulating materials for low-temperature processing of organic thin-film transistors

2018 ◽  
Vol 6 (48) ◽  
pp. 13359-13366 ◽  
Author(s):  
Joo-Young Kim ◽  
Ji Whan Kim ◽  
Eun Kyung Lee ◽  
Jeong-Il Park ◽  
Bang-Lin Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Breakdown Voltage ◽  
Thin Film Transistors ◽  
Organic Thin Film Transistors ◽  
Organic Thin Film ◽  
Insulating Materials ◽  
Plastic Substrates ◽  
Insulating Material ◽  
Low Temperature Processing

This paper reports a polymeric gate insulating material of poly(hydroxy imide) cured at the low temperature of 130 °C for the application to organic thin-film transistors on plastic substrates exhibiting high breakdown voltage and no hysteresis.

Low-temperature processing and characterization of single-phase PZT powders by sol-gel method

2007 ◽  
Vol 42 (23) ◽  
pp. 9801-9806 ◽  
Author(s):  
Radhouane Bel Hadj Tahar ◽  
Noureddine Bel Hadj Tahar ◽  
Abdelhamid Ben Salah
Keyword(s):  
Low Temperature ◽  
Single Phase ◽  
Sol Gel ◽  
Gel Method ◽  
Sol Gel Method ◽  
Low Temperature Processing
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