scholarly journals Formation of Si Nano Hole Arrays Using a Self-assembled Nanolithography Mask and Cu Fill of the Array

2013 ◽  
Vol 64 (12) ◽  
pp. 659-661
Author(s):  
Eiichi KONDOH ◽  
Kakeru TAMAI ◽  
Michio MATSUMURA
Keyword(s):  
Self Assembled ◽  
Hole Arrays

scholarly journals Vortices in dense self-assembled hole arrays

2003 ◽  
Vol 387 (1-2) ◽  
pp. 49-56 ◽  
Author(s):  
G.W. Crabtree ◽  
U. Welp ◽  
Z.L. Xiao ◽  
J.S. Jiang ◽  
V.K. Vlasko-Vlasov ◽  
...  
Keyword(s):  
Self Assembled ◽  
Hole Arrays

Scalable Nanomanufacturing of Metasurfaces Using Nanosphere Photolithography

2014 ◽  
Author(s):  
Jacob S. Wilson ◽  
Wipula P. R. Liyanage ◽  
Michelle L. Gegel ◽  
Manashi Nath ◽  
Edward C. Kinzel
Keyword(s):  
Normal Incidence ◽  
Hole Array ◽  
Frequency Selective Surfaces ◽  
Metal Elements ◽  
Hexagonal Close Packed ◽  
Frequency Selective ◽  
Self Assembled ◽  
Hole Arrays ◽  
Lift Off ◽  
Microsphere Array

We report on using Nanosphere Photolithography (NPL) for submicron patterning of Frequency Selective Surfaces (FSS). NPL is a combination of two techniques; colloidal nanolithography — where nanospheres form a self-assembled hexagonal close-packed (HCP) array when dispensed on a surface, and photonic jets — which are created when light is incident onto a microsphere in contact with a surface. NPL creates a mask-free HCP hole array in the photoresist. This pattern can be used with evaporation and lift-off to create an array of antenna elements, constituting the FSS. Alternatively, electrodeposition techniques can be used to deposit the metal elements. The later is particularly appealing as it lends itself to reel-to-reel fabrication techniques. Finally, we demonstrate that geometries other than simple hole arrays can be patterned in the photoresist by exposing the microsphere array with off normal incidence light.

Electrochemical behavior of self-assembled monolayers based on functionalized oligothiophenes

1998 ◽  
Vol 95 (6) ◽  
pp. 1339-1342 ◽  
Author(s):  
R. Michalitsch ◽  
A. El Kassmi ◽  
P. Lang ◽  
A. Yassar ◽  
F. Garnier
Keyword(s):  
Electrochemical Behavior ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Imaging of patterned self-assembled monolayers by scanning photoelectron microscopy

2003 ◽  
Vol 104 ◽  
pp. 459-462 ◽  
Author(s):  
R. Klauser ◽  
M. Zharnikov ◽  
I.-H. Hong ◽  
S.-C. Wang ◽  
A. Gölzhäuser ◽  
...  
Keyword(s):  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Scanning Photoelectron Microscopy ◽  
Self Assembled

Magnetotunneling spectroscopy imaging of electron wave functions in self-assembled InAs quantum dots

2001 ◽  
Vol 171 (12) ◽  
pp. 1365
Author(s):  
E.E. Vdovin ◽  
Yu.N. Khanin ◽  
Yu.V. Dubrovskii ◽  
A. Veretennikov ◽  
A. Levin ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Wave Functions ◽  
Electron Wave ◽  
Inas Quantum Dots ◽  
Self Assembled
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