Excimer Laser Ablation of High Aspect Ratio Microvias Using a Novel Sensitizer-Enhanced Photopolymer
2011 ◽
Vol 8
(2)
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pp. 66-71
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Keyword(s):
A new drop-in sensitizer has been developed for use with COTS negative tone photoresist to facilitate the laser fabrication of high aspect ratio microstructures in a thick film of photopolymer. Microvias with diameters as small as 50 μm have been successfully laser ablated in a 160 μm thick layer of the sensitized photoresist. Ablation rates of up to 86 nm/pulse have been achieved with an excimer laser.
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2009 ◽
Vol 256
(1)
◽
pp. 183-186
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1998 ◽
Vol 100-101
◽
pp. 424-427
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Keyword(s):
1992 ◽
Vol 12
(4)
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pp. 390-396
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