Copper, Nickel, and Lead-Free Solder Electroplating Solutions for Pillar and Micro-Pillar Capping Applications
Control of height-uniformity, morphology, and interfacial properties is critical to achieving high-yield, high-reliability Copper Pillar and Copper Micro-Pillar capped structures for flip-chip and 3D Packaging applications. The plating chemistries selected for electrolytic copper, barrier layer, and lead-free solder deposition significantly affect these properties. A range of copper plating chemistries is evaluated for plating performance and deposit properties for 20um diameter and 75um diameter pillar plating. Height uniformity, pillar shape, surface morphology, and physical properties are compared. These electroplated copper pillars are then evaluated for compatibility with barrier layers and lead-free solder capping. Post-reflow IMC formation, interfacial properties, and micro-voiding phenomena are studied and the effect of the plating chemistry on the overall compatibility of layers in stacked structures is discussed.