Effects of gas flow rate on the etch characteristics of a low-k sicoh film with an amorphous carbon mask in dual-frequency CF4/C4F8/Ar capacitively-coupled plasmas
2013 ◽
Vol 62
(1)
◽
pp. 67-72
◽
Keyword(s):
Gas Flow
◽
Infuence of Nitrogen Gas Flow Rate on Nitrogenated Amorphous Carbon Film for Solar Cell Applications
2015 ◽
Vol 1109
◽
pp. 138-142
Keyword(s):
Gas Flow
◽
1966 ◽
Vol 31
(3)
◽
pp. 1152-1161
◽
1998 ◽
Vol 63
(6)
◽
pp. 881-898