Comparison of laser-induced damage in Ta2O5 and Nb2O5 single-layer films and high reflectors

2011 ◽  
Vol 9 (1) ◽  
pp. 013102-13105 ◽  
Author(s):  
许程 Cheng Xu ◽  
赵宇龙 Yulong Zhao ◽  
强颖怀 Yinghuai Qiang ◽  
朱亚波 Yabo Zhu ◽  
郭立童 Litong Guo ◽  
...  
Keyword(s):  
Single Layer ◽  
Laser Induced Damage

scholarly journals Comparison of Single-Layer and Double-Layer Anti-Reflection Coatings Using Laser-Induced Damage Threshold and Photothermal Common-Path Interferometry

Coatings ◽  
2016 ◽  
Vol 6 (2) ◽  
pp. 20 ◽  
Author(s):  
Caspar Clark ◽  
Riccardo Bassiri ◽  
Iain Martin ◽  
Ashot Markosyan ◽  
Peter Murray ◽  
...  
Keyword(s):  
Double Layer ◽  
Single Layer ◽  
Damage Threshold ◽  
Common Path ◽  
Laser Induced Damage

scholarly journals Quantitative investigation of laser-induced damage fatigue in HfO2 and ZrO2 single layer coatings

2020 ◽  
Vol 28 (17) ◽  
pp. 25335
Author(s):  
Linas Smalakys ◽  
Evelina Drobužaitė ◽  
Balys Momgaudis ◽  
Robertas Grigutis ◽  
Andrius Melninkaitis
Keyword(s):  
Single Layer ◽  
Quantitative Investigation ◽  
Laser Induced Damage

Absorption and laser-induced damage threshold of single-layer HfO2 film

2010 ◽  
Vol 22 (11) ◽  
pp. 2596-2598
Author(s):  
李淑红 Li Shuhong ◽  
贺洪波 He Hongbo ◽  
刘晓凤 Liu Xiaofeng ◽  
单永光 Shan Yongguang ◽  
周明 Zhou Ming ◽  
...  
Keyword(s):  
Single Layer ◽  
Damage Threshold ◽  
Hfo2 Film ◽  
Laser Induced Damage

Influence of Laser-Conditioning on Laser-Induced Damage Properties of ZnSe Thin Films

2012 ◽  
Vol 602-604 ◽  
pp. 1437-1443
Author(s):  
Feng Zou ◽  
Jun Qi Xun ◽  
Jun Hong Su ◽  
Jian Bo Ma
Keyword(s):  
Thin Films ◽  
Energy Density ◽  
Wave Length ◽  
Single Layer ◽  
Damage Threshold ◽  
Processing Parameters ◽  
Spot Size ◽  
Pulse Number ◽  
Optical Films ◽  
Laser Induced Damage

With the development of high power laser systems, laser protection of optical components becomes more and more important. In order to enhance the laser-induced damage capability of optical films components, besides advanced methods and processes, post-treatment has significant influence on the laser-induced damage threshold (LIDT) of thin films. Q switch Nd:YAG laser of the working wave length at 1064nm, was used to post process on ZnSe single layer films with thickness of /2 (=1064nm) deposited by thermal evaporation, and the laser-induced damage and optical properties were investigated. By changing the energy density and pulse number under the spot size remained a fixed value, their effects on thin films damage threshold were studied respectively, the optimal processing parameters were obtained: energy density is 3.0 J/cm2 and pulse number is 1.The LIDT of post processed ZnSe films was improved from 5.0J/cm2 to 8.2J/cm2.

Fabrication Fluoride High Reflection Mirror by Thermal Evaporation in the ArF Excimer Laser

2013 ◽  
Vol 552 ◽  
pp. 252-255
Author(s):  
Yan He Chang ◽  
Chun Shui Jin ◽  
Chun Li ◽  
Jing Cheng Jin
Keyword(s):  
Excimer Laser ◽  
Thermal Evaporation ◽  
Optical Loss ◽  
Single Layer ◽  
Laser Cavity ◽  
Fused Silica ◽  
Scattering Loss ◽  
Arf Excimer Laser ◽  
Laser Induced Damage ◽  
High Reflection

ArF excimer laser is the main light resource for the microlithography technology. In the laser cavity, the optical components with lowest absorption and scattering loss are necessary. As a consequence only a few materials are promising candidates for 193nm coatings with high transmittance or high reflectance. Fluoride films exhibit relatively low optical loss as well as high laser induced damage thresholds. The potentiality of LaF3 and MgF2 is evaluated in respect of the production of improved optical coatings for applications. For this purpose, single layer is prepared by thermal evaporation at the deposited temperatures of 523K on Fused Silica. A first order bulk inhomogeneity model for extracting the optical constants of weak absorbing film is applied, which is based on spectrophotometry. Refractive index (n) and extinction coefficient (k) of the optimal LaF3 film are 1.678 and 2.24×10-3 at 193nm. In the case of the optimal MgF2 film, n and k are 1.443 and 4.72×10-4 at 193nm. High reflection (HR) LaF3/MgF2 coatings are designed and fabricated for normal incident on CaF2. The experimental results indicate that after coated and fluoride coatings deposit, according to optimal process, can have more suitable optical properties at deep ultraviolet (DUV), the reflectance of HR coatings reaches more than 98% at 193nm.

scholarly journals SSD detection on LIDT tested coated Fused Silica samples

2021 ◽  
Vol 255 ◽  
pp. 03009
Author(s):  
Heidi Cattaneo ◽  
Daniel Schachtler ◽  
Roelene Botha ◽  
Oliver Fähnle
Keyword(s):  
Laser Energy ◽  
Substrate Surface ◽  
Single Layer ◽  
Damage Threshold ◽  
Surface Damage ◽  
Laser Pulses ◽  
Fused Silica ◽  
Small Surface ◽  
Additional Information ◽  
Laser Induced Damage

Material changes and Sub-Surface Damage (SSD) under Laser Induced Damage Threshold (LIDT) testing sites were investigated on 3 diverse single layer coated transparent fused silica samples to obtain additional information on damage precursors on these samples. As a detection method, photothermal deflection technique utilizing a resonant UV laser beam was used. The local variations in UV absorption and probe beam transmittance due to previous exposure to high fluence laser pulses were strongly dependent on the coating itself and on the laser energy used during the LIDT testing. Also the obtained LIDT values differ from coating to coating. Detected effects on the coatings and substrate surface beneath ranged from small surface dislocations to complete coating damage with material transformations. Additional absorbing damage precursors were found close to the damaged sites.

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