Surface chemical analysis � X-ray photoelectron spectroscopy � Reporting of methods used for charge control and charge correction

Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction

10.3403/03239706u ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Surface Chemical ◽

X Ray ◽

Charge Control ◽

Surface Chemical Analysis

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Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction

10.3403/03239706 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Surface Chemical ◽

X Ray ◽

Charge Control ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 standard: XVIII, ISO 19318:2004—surface chemical analysis—X-ray photoelectron spectroscopy—Reporting of methods used for charge control and charge correction

Surface and Interface Analysis ◽

10.1002/sia.2034 ◽

2005 ◽

Vol 37 (5) ◽

pp. 524-526 ◽

Cited By ~ 9

Author(s):

D. R. Baer

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Surface Chemical ◽

X Ray ◽

Charge Control ◽

Surface Chemical Analysis

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Surface chemical analysis. X-ray photoelectron spectroscopy. Description of selected instrumental performance parameters

10.3403/03239721 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Surface Chemical ◽

Performance Parameters ◽

Instrumental Performance ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of results of thin-film analysis

10.3403/30206251 ◽

2013 ◽

Keyword(s):

Thin Film ◽

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Surface Chemical ◽

Film Analysis ◽

X Ray ◽

Thin Film Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results

10.3403/30242215 ◽

2011 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Electron spectroscopies. Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy

10.3403/30281227u ◽

2016 ◽

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

X Rays ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. X-ray photoelectron spectroscopy. Estimating and reporting detection limits for elements in homogeneous materials

10.3403/30333433u ◽

2017 ◽

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Detection Limits ◽

Surface Chemical ◽

X Ray ◽

Homogeneous Materials ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 Standard: XXIX. ISO 20903: 2006—Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—methods used to determine peak intensities and information required when reporting results

Surface and Interface Analysis ◽

10.1002/sia.2533 ◽

2007 ◽

Vol 39 (5) ◽

pp. 464-466 ◽

Cited By ~ 7

Author(s):

C. J. Powell

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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