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Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
Mapping Intimacies
◽
10.3403/30212266
◽
2011
◽
Keyword(s):
Chemical Analysis
◽
Photoelectron Spectroscopy
◽
Silicon Oxide
◽
Oxide Thickness
◽
Surface Chemical
◽
X Ray
◽
Spectroscopy Measurement
◽
Surface Chemical Analysis
Download Full-text
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Summary of ISO/TC 201 Standard: ISO 14701:2011 - Surface chemical analysis - X-ray photoelectron spectroscopy-measurement of silicon oxide thickness
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◽
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◽
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◽
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