scholarly journals Investigations of Transient Plasma Generated by Laser Ablation of Hydroxyapatite during the Pulsed Laser Deposition Process

Symmetry ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 132
Author(s):  
Maricel Agop ◽  
Nicanor Cimpoesu ◽  
Silviu Gurlui ◽  
Stefan Andrei Irimiciuc
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Optical Emission ◽  
Deposition Process ◽  
Fractal Model ◽  
Laser Deposition ◽  
Global Dynamics ◽  
High Laser Fluence ◽  
Laser Produced Plasma ◽  
The Individual

The optimization of the pulsed laser deposition process was attempted here for the generation of hydroxyapatite thin films. The deposition process was monitored with an ICCD (Intensified Coupled Charged Device) fast gated camera and a high-resolution spectrometer. The global dynamics of the laser produced plasma showed a self-structuring into three components with different composition and kinetics. The optical emission spectroscopy revealed the formation of a stoichiometric plasma and proved that the segregation in the kinetic energy of the plasma structure is also reflected by the individual energies of the ejected particles. Atomic Force Microscopy was also implemented to investigate the properties and the quality of the deposited film. The presence of micrometric clusters was seen at a high laser fluence deposition with in-situ ICCD imaging. We developed a fractal model based on Schrödinger type functionalities. The model can cover the distribution of the excited states in the laser produced plasma. Moreover, we proved that SL(2R) invariance can facilitate plasma substructures synchronization through a self-modulation in amplitude.

scholarly journals Dynamics of Transient Plasmas Generated by ns Laser Ablation of Memory Shape Alloys

2020 ◽  
Author(s):  
Stefan Andrei Irimiciuc ◽  
Norina Forna ◽  
Andrei Agop ◽  
Maricel Agop ◽  
Stefan Toma ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser Deposition ◽  
Emission Spectroscopy ◽  
Pulsed Laser ◽  
Optical Emission ◽  
Laser Deposition ◽  
Global Dynamics ◽  
Time Resolved ◽  
Laser Ablation Process ◽  
Key Techniques

Understanding the underline fundamental mechanism behind experimental and industrial technologies embodies one of the foundations of the advances and tailoring new materials. With the pulsed laser deposition being one of the key techniques for obtaining complex biocompatible materials with controllable stoichiometry, there is need for experimental and theoretical advancements towards understanding the dynamics of multi component plasmas. Here we investigate the laser ablation process on Cu-Mn-Al and Fe-Mn-Si by means of space-and time-resolved optical emission spectroscopy and fast camera imaging. In a fractal paradigm the space–time homographic transformations were correlated with the global dynamics of the ablation plasmas.

scholarly journals The Curious Case of Transient Plasma Generated by ns-laser Ablation of Ag in Ar Gas

2020 ◽  
Author(s):  
Stefan Irimiciuc ◽  
Sergii Chertopalov ◽  
Jiŕí Bulíř ◽  
Ladislav Fekete ◽  
Michal Novotný ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Complex Dynamics ◽  
Pulsed Laser ◽  
Optical Emission ◽  
Deposition Process ◽  
Laser Deposition ◽  
Electrical Measurements ◽  
Electronic Distribution ◽  
Ar Gas

Abstract The continuous effort for transitioning pulsed laser deposition technique from an experimental tool into an industrial one is sustained by the use of complex technologies for in situ real-time monitoring of the deposition process. Floating Langmuir Probe (LP) and optical emission spectroscopy (OES) measurements were used for plasma monitoring during the pulsed laser deposition of Ag films under various Ar pressure conditions. The electrical measurements revealed a complex multi-structured distribution of the ions, which was strongly influenced by the increase of Ar pressure. The generation of highly energetic ions with the addition of Ar and the degree of Ar gas ionization was also explored. OES measurements confirmed the presence of highly ionized Ar species in the plasma. A peculiar effect was seen under pressures higher than 10 Pa, where the presence of high electronic charges lead to a perturbative behavior of plasma in the vicinity of the LP. The effect of these complex dynamics on the structure and quality of the deposited thin film was also investigated revealing a strong correlation between the electronic distribution in plasma and thin film thickness profile.

Effects of Single-Crystalline GaN Target on GaN Thin Films in Pulsed Laser Deposition Process

2005 ◽  
Vol 44 (11) ◽  
pp. 7896-7900 ◽  
Author(s):  
Takahiro Nagata ◽  
Young-Zo Yoo ◽  
Parhat Ahmet ◽  
Toyohiro Chikyow
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Single Crystalline

Pulsed laser deposition process of PLZT thin films using an infrared Nd:YAG laser

2006 ◽  
Vol 252 (10) ◽  
pp. 3783-3788 ◽  
Author(s):  
T. García ◽  
E. de Posada ◽  
P. Bartolo-Pérez ◽  
J.L. Peña ◽  
R. Diamant ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Nd:Yag Laser ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
Plzt Thin Films

New developments of pulsed-laser deposition process

1998 ◽  
Author(s):  
Tatsuo Okada ◽  
Yoshiki Nakata ◽  
Junichi Muramoto ◽  
Mitsuo Maeda
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Deposition Process ◽  
Laser Deposition ◽  
New Developments

Cross-Sectional Nanoindentation of Alumina Thin Films Deposited by Pulsed Laser Deposition Process

2006 ◽  
Author(s):  
Sudheer Neralla ◽  
Sergey Yarmolenko ◽  
Dhananjay Kumar ◽  
Devdas Pai ◽  
Jag Sankar
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
High Hardness ◽  
Deposition Process ◽  
Laser Deposition ◽  
Cross Sectional ◽  
Adhesion Properties ◽  
Force Microscopy ◽  
Atomic Force

Alumina is a widely used ceramic material due to its high hardness, wear resistance and dielectric properties. The study of phase transformation and its correlation to the mechanical properties of alumina is essential. In this study, interfacial adhesion properties of alumina thin films are studied using cross-sectional nanoindentation (CSN) technique. Alumina thin films are deposited at 200 and 700 °C, on Si (100) substrates with a weak Silica interface, using pulsed laser deposition (PLD) process. Effect of annealing on the surface morphology of the thin films is studied using atomic force microscopy. Xray diffraction studies revealed that alumina thin films are amorphous in nature at 200 °C and polycrystalline with predominant gamma alumina phase at 700 °C.

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