Noncontact and Full-Field Measurement of Residual and Thermal Stress in Film/Substrate Structures
Keyword(s):
Residual stress and thermal stress of a film/substrate system are determined based on the curvature measurement with a 3D digital image correlation method (DIC) and calculation of the thin-film stresses by the extension of Stoney’s formula. A Ni film electroplated on a H62Cu plate is used to verify the proposed method. The full fields of nonuniform thin-film stresses are obtained in a room temperature to high-temperature environment of 200 °C, which can be potentially extended to higher temperatures. These results provide a fundamental approach to understanding thin-film stresses and a feasible measurement method for high temperature.
2018 ◽
Vol 58
(7)
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pp. 1049-1066
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2018 ◽
Vol 146
(7-8)
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pp. 372-377
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2010 ◽
Vol 22
(1)
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pp. 015701
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2012 ◽
Vol 14
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pp. 186-191
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2011 ◽
Vol 83
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pp. 54-59
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2021 ◽