scholarly journals Fast Hydrogenation and Dehydrogenation of Pt/Pd Bimetal Decorated over Nano-Structured Ag Islands Grown on Alumina Substrates

Sensors ◽  
2018 ◽  
Vol 19 (1) ◽  
pp. 86 ◽  
Author(s):  
Md Rahaman ◽  
Usman Yaqoob ◽  
Hyeon Kim
Keyword(s):  
Magnetron Sputtering ◽  
Operating Temperature ◽  
Rf Magnetron Sputtering ◽  
Vital Role ◽  
Alumina Substrate ◽  
Interfacial Structure ◽  
Rapid Thermal Annealing Process ◽  
Detection Range ◽  
Thermal Annealing Process ◽  
Induced Changes

This study reports the fast hydrogenation and dehydrogenation of ultra-thin discrete platinum/palladium (Pt/Pd) bimetal over nano-structured Ag islands grown on rough alumina substrate by a RF magnetron sputtering technique. The morphology of Ag nanoislands was optimized by RF magnetron sputtering and rapid thermal annealing process. Later, Pt/Pd bimetal (10/10) nm were deposited by RF magnetron sputtering on the nanostructured Ag islands. After the surface morphological optimization of Ag nanoislands, the resultant structure Pt/Pd@Ag nanoislands at alumina substrate showed a fast and enhanced hydrogenation and dehydrogenation (20/25 s), response magnitude of 2.3% (10,000 ppm), and a broad detection range of 500 to 40,000 ppm at the operating temperature of 120 °C. The superior hydrogenation and dehydrogenation features can be attributed to the hydrogen induced changes in the work function of Pt/Pd bimetal which enhances the coulomb scattering of percolated Pt/Pd@Ag nanoislands. More importantly, the atomic arrangements and synergetic effects of complex metal alloy interfacial structure on Ag nanoislands, supported by rough alumina substrate incorporate the vital role in accelerating the H2 absorption and desorption properties.

Substrate Purity Dependence of Heating Characteristics for Ca-Doped-LaCrO3 Thin Film Electric Heaters

2006 ◽  
Vol 301 ◽  
pp. 171-176 ◽  
Author(s):  
Yuki Ito ◽  
Kenichi Wakisaka ◽  
Hiroyasu Kado ◽  
Shinzo Yoshikado
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Current Drive ◽  
Alumina Substrate ◽  
The Other ◽  
Lanthanum Chromite ◽  
Pt Electrode ◽  
Dc Current

Thin film heaters made of Ca-doped lanthanum chromite (LaCrO3) are fabricated by means of RF magnetron sputtering. Thin films of Ca-doped LaCrO3 show different heating characteristics under dc current drive for different purities of alumina substrate. In the case of a low purity (95.3%), LaCrO3 thin film heaters showed an increase of resistance with time. On the other hand, in the case of high purity (approximately 99.5%), the resistance was almost constant. It is speculated that impurities such as SiO2 contained in an alumina substrate enhance the migration of Ca atoms through the Pt electrode and increase the resistance because of the decrease of Ca atoms in the thin film. It is considered that the increase of resistance is caused by such a reaction.

Study on Al-Doped ZnO Films Prepared by Magnetron Sputtering with Rapid Thermal Annealing Process

2010 ◽  
Vol 97-101 ◽  
pp. 582-585
Author(s):  
Hua Wang ◽  
Ji Wen Xu ◽  
Ming Fang Ren ◽  
Ling Yang
Keyword(s):  
Electrical Resistivity ◽  
Magnetron Sputtering ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Annealing Temperature ◽  
Annealing Process ◽  
Rapid Thermal Annealing Process ◽  
Sputtering Power ◽  
Thermal Annealing Process ◽  
Doped Zno

Transparent and conductive Al-doped ZnO (AZO) films were prepared by nonreactive DC magnetron sputtering with rapid thermal annealing process. The effects of sputtering power and annealing temperature on growth behavior, electrical rand optical properties of AZO films were investigated. The experimental results show that the sputtering power and annealing temperature had great influence on the electrical resistivity of AZO films due to the change of (002) orientation and grain size. The lowest electrical resistivity of AZO films was 5.3×10-4Ω•cm when the sputtering power was 100W and the annealing temperature was 200°C or above. The sputtering power and annealing temperature had little effect on optical transmittance, which was between 86% and 90%, but the absorption edge had a blue shift with the increase of sputtering power and annealing temperature.

Triboluminescence of SrAl2O4:Eu Film with Strong Adhesion Fabricated by a Combination of RF Magnetron Sputtering and Post-Annealing Treatment

2008 ◽  
Vol 368-372 ◽  
pp. 1362-1365 ◽  
Author(s):  
Hiroshi Yamada ◽  
Xiao Yan Fu ◽  
Chao Nan Xu
Keyword(s):  
Magnetron Sputtering ◽  
Rough Surface ◽  
Amorphous State ◽  
Annealing Treatment ◽  
Rf Magnetron Sputtering ◽  
Alumina Substrate ◽  
Post Annealing ◽  
Strong Adhesion

Strongly adherent SrAl2O4:Eu films were fabricated on the rough surface of an alumina substrate by a combination of the RF magnetron sputtering technique and a post-annealing treatment. A crystalline SrAl2O4:Eu2+ film was achieved after annealing at 1000°C in reduced atmosphere and it exhibit a intensively green PL and triboluminescence (TL) while an as-deposition film showed the amorphous state and weakly red photoluminescence (PL). It was found that the fabricated films possessed a strong durability of a friction, exhibiting no peeling, cracking, and breaking in the films after TL measurements. These results will facilitate a development of novel TL skin sensors.

Single Crystal, High Band Gap CdS Thin Films Grown by RF Magnetron Sputtering in Argon Atmosphere for Solar Cell Applications

2018 ◽  
Vol 10 (3) ◽  
pp. 03005-1-03005-6 ◽  
Author(s):  
Rupali Kulkarni ◽  
◽  
Amit Pawbake ◽  
Ravindra Waykar ◽  
Ashok Jadhawar ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Magnetron Sputtering ◽  
Single Crystal ◽  
Band Gap ◽  
Rf Magnetron Sputtering ◽  
Argon Atmosphere ◽  
Cds Thin Films ◽  
High Band

scholarly journals Effects of Long Durations of RF–Magnetron Sputtering Deposition of Hydroxyapatite on Titanium Dental Implants

2021 ◽  
Author(s):  
Ihab Nabeel Safi ◽  
Basima Mohammed Ali Hussein ◽  
Hikmat J. Aljudy ◽  
Mustafa S. Tukmachi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Magnetron Sputtering ◽  
Dental Implants ◽  
Substrate Surface ◽  
Rf Magnetron Sputtering ◽  
P Value ◽  
Edx Analysis ◽  
Significant Difference ◽  
Scanning Electron

Abstract Objectives Dental implant is a revolution in dentistry; some shortages are still a focus of research. This study use long duration of radiofrequency (RF)–magnetron sputtering to coat titanium (Ti) implant with hydroxyapatite (HA) to obtain a uniform, strongly adhered in a few micrometers in thickness. Materials and Methods Two types of substrates: discs and root form cylinders were prepared using a grade 1 commercially pure (CP) Ti rod. A RF–magnetron sputtering device was used to coat specimens with HA. Magnetron sputtering was set at 150 W for 22 hours at 100°C under continuous argon gas flow and substrate rotation at 10 rpm. Coat properties were evaluated via field emission scanning electron microscopy (FESEM), scanning electron microscopy–energy dispersive X-ray (EDX) analysis, atomic force microscopy, and Vickers hardness (VH). Student’s t-test was used. Results All FESEM images showed a homogeneous, continuous, and crack-free HA coat with a rough surface. EDX analysis revealed inclusion of HA particles within the substrate surface in a calcium (Ca)/phosphorus (P) ratio (16.58/11.31) close to that of HA. Elemental and EDX analyses showed Ca, Ti, P, and oxygen within Ti. The FESEM views at a cross-section of the substrate showed an average of 7 µm coat thickness. Moreover, these images revealed a dense, compact, and uniform continuous adhesion between the coat layer and the substrate. Roughness result indicated highly significant difference between uncoated Ti and HA coat (p-value < 0.05). A significant improvement in the VH value was observed when coat hardness was compared with the Ti substrate hardness (p-value < 0.05). Conclusion Prolonged magnetron sputtering successfully coat Ti dental implants with HA in micrometers thickness which is well adhered essentially in excellent osseointegration.

Large-area CsPbBr3 perovskite films grown with effective one-step RF-magnetron sputtering

2021 ◽  
Vol 129 (24) ◽  
pp. 245303
Author(s):  
Fan Xu ◽  
Yujiao Li ◽  
Beilei Yuan ◽  
Yongzheng Zhang ◽  
Haoming Wei ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Large Area ◽  
One Step
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