scholarly journals Special Issue “Materials Processing for Production of Nanostructured Thin Films”

Processes ◽  
2021 ◽  
Vol 9 (2) ◽  
pp. 298
Author(s):  
Keith J. Stine

The field of thin film technology [...]

2018 ◽  
Vol 7 (6) ◽  
pp. 433-451 ◽  
Author(s):  
HO SOONMIN

Thin film technology is getting huge attention across the world due to its wide applications. Deposition of thin films involves creation, transportation and condensation of target materials with thickness varying from few nanometers to several microns onto the substrate. This review will highlight thin film depositing techniques which consist of non-vacuum and vacuum based deposition method. Besides this, thin films and their applications in gas sensing and corrosion protection have also been discussed.


Author(s):  
E.L. Veera Prabakaran ◽  
K Senthil Vadivu ◽  
B Mouli Prasanth

Abstract Thin film sensors are used to monitor environmental conditions by measuring the physical parameters. By using thin film technology, the sensors are capable of conducting precise measurements. Moreover, the measurements are stable and dependable. Furthermore, inexpensive sensor devices can be produced. In this paper, thin film technology for the design and fabrication of sensors that are used in various applications is reviewed. Further, the applications of thin film sensors in the fields of biomedical, energy harvesting, optical, and corrosion applications are also presented. From the review, the future research needs and future perspectives are identified and discussed.


RSC Advances ◽  
2015 ◽  
Vol 5 (57) ◽  
pp. 46229-46239 ◽  
Author(s):  
Naidu Dhanpal Jayram ◽  
S. Sonia ◽  
Palaniswamy Suresh Kumar ◽  
L. Marimuthu ◽  
Yoshitake Masuda ◽  
...  

Highly monodispersed Ag embedded SiO2 nanostructured thin films have been synthesized and their sensitivity towards SERS investigated.


2012 ◽  
Vol 576 ◽  
pp. 577-581 ◽  
Author(s):  
N.D.M. Sin ◽  
Mohamad Hafiz Mamat ◽  
Mohamed Zahidi Musa ◽  
S. Ahmad ◽  
A. Abdul Aziz ◽  
...  

The effect of RF power on the formation and morphology evolution of ZnO nanostructured thin films deposited by magnetron sputtering are presented. This project focused on electrical, optical and structural properties of ZnO thin films. The effect of variation of RF power at 50 watt-250 watt at 200 °C on glass substrate of the ZnO thin films was investigated. The thin films were examined for electrical properties and optical properties using two point probe current-voltage (I-V) measurement (Keithley 2400) and UV-Vis-NIR spectrophotometer (JASCO 670) respectively. The structural properties were characterized using field emission scanning electron microscope (FESEM) (JEOL JSM 7600F) and atomic force microscope (AFM) (Park System XE-100). The IV measurement indicated that at RF power 200 watt the conductivity of ZnO thin film show the highest. All films show high UV absorption properties using UV-VIS spectrophotometer (JASCO 670). The root means square (rms) roughness for ZnO thin film were about 4 nm measured using AFM. The image form FESEM observed that transformation of structure size started to change as the RF power increase.


Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1228
Author(s):  
Ross Birney

Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas [...]


2020 ◽  
Author(s):  
Hasmat Khan ◽  
Saswati Sarkar ◽  
Moumita Pal ◽  
Susanta Bera ◽  
Sunirmal Jana

Nanostructured metal oxide semiconductors (MOS) in the form of thin film or bulk attract significant interest of materials researchers in both basic and applied sciences. Among these important MOSs, indium oxide (IO) is a valuable one due to its novel properties and wide range of applications in diversified fields. IO based nanostructured thin films possess excellent visible transparency, metal-like electrical conductivity and infrared reflectance properties. This chapter mainly highlights the synthesis strategies of IO based bulk nanomaterials with variable morphologies starting from spherical nanoparticles to nano-rods, nano-wires, nano-needles, nanopencils, nanopushpins etc. In addition, thin film deposition and periodic 1-dimensional (1D)/2-dimensional (2D) surface texturing techniques of IO based nanostructured thin films vis-à-vis their functional properties and applications have been discussed. The chapter covers a state-of-the-art survey on the fabrication strategies and recent advancement in the properties of IO based nanomaterials with their different areas of applications. Finally, the challenges and future prospect of IO based nanomaterials have been discussed briefly.


Author(s):  
George Z. Voyiadjis ◽  
Babur Deliktas

Thin film technology is pervasive in many applications, including microelectronics, optics, magnetic, hard and corrosion resistant coatings, micromechanics, etc. Therefore, basic research activities will be necessary in the future to increase knowledge and understanding and to develop predictive capabilities for relating fundamental physical and chemical properties to the microstructure and performance of thin films in various applications. In basic research, special model systems are needed for quantitative investigation of the relevant and fundamental processes in thin film material science. Because of the diversity of the subject and the sheer volume of the publications, a complete a review of the area of the current study is focused particularly on the experimental and theoretical investigations for the inelastic behavior of the micro-/nanostructured thin films.


2021 ◽  
Author(s):  
Aldo J.G. Zarbin

Thin film technology is pervasive for many fields with high impact in our daily lives, which makes processing materials such as thin films a very important subject in materials science...


2021 ◽  
Author(s):  
Edwin Acosta

Since its discovery in early times, thin films rapidly found industrial applications such as in decorative and optics purposes. With the evolution of thin film technology, supported by the development of vacuum technology and electric power facilities, the range of applications has increased at a level that nowadays almost every industrial sector make use of them to provide specific physical and chemical properties to the surface of bulk materials. The possibility to tailor the film properties through the variation of the microstructure via the deposition parameters adopted in a specific deposition technique has permitted their entrance from the simplest like protective coatings against wear and corrosion to the most technological advanced applications such as microelectronics and biomedicine, recently. In spite of such impressive progress, the connection among all steps of the thin film production, namely deposition parameters-morphology and properties, is not fully accurate. Among other reasons, the lack of characterization techniques suitable for probing films with thickness less than a single atomic layer, along with a lack of understanding of the physics have impeded the elaboration of sophisticated models for a precise prediction of film properties. Furthermore, there remain some difficulties related to the large scale production and a relative high cost for the deposition of advanced structures, i.e. quantum wells and wires. Once these barriers are overcome, thin film technology will become more competitive for advanced technological applications.


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