scholarly journals Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition

Polymers ◽  
2020 ◽  
Vol 12 (2) ◽  
pp. 354 ◽  
Author(s):  
Mehrnoush Narimisa ◽  
František Krčma ◽  
Yuliia Onyshchenko ◽  
Zdenka Kozáková ◽  
Rino Morent ◽  
...  
Keyword(s):  
Flow Rate ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Plasma Jet ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Organic Thin Film ◽  
Gas Flow Rate ◽  
Homogeneous Surface

In this work, the potential of a microwave (MW)-induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non-uniform monomer distribution near the substrate and the dependency of the deposition area on the monomer-containing gas flow rate. A non-homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.

Variation of thin film deposition rate on SS 314 with the variation of gas flow rate using CVD

2011 ◽  
Vol 63 (6) ◽  
pp. 433-439 ◽  
Author(s):  
Mohammad Asaduzzaman Chowdhury ◽  
Dewan Muhammad Nuruzzaman ◽  
Khaled Khalil ◽  
Mohammad Lutfar Rahaman
Keyword(s):  
Thin Film ◽  
Deposition Rate ◽  
Flow Rate ◽  
Gas Flow ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Gas Flow Rate ◽  
Film Deposition Rate

Deposition on SS 316 at Different Gas Flow Rates Using Thermal CVD

2012 ◽  
Vol 576 ◽  
pp. 594-597 ◽  
Author(s):  
Mohammad Asaduzzaman Chowdhury ◽  
Dewan Muhammad Nuruzzaman
Keyword(s):  
Friction Coefficient ◽  
Wear Rate ◽  
Deposition Rate ◽  
Flow Rate ◽  
Gas Flow ◽  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Gas Flow Rate ◽  
Flow Rates

A hot filament thermal chemical vapor deposition (CVD) reactor was used to deposit solid thin films on stainless steel 316 (SS 316) substrates at different flow rates of natural gas. The variation of thin film deposition rate with the variation of gas flow rate has been investigated experimentally. During experiment, the effect of gap between activation heater and substrate on the deposition rate has also been observed. Results show that deposition rate on SS 316 increases with the increase in gas flow rate. It is also observed that deposition rate increases with the decrease in gap between activation heater and substrate within the observed range. In addition, friction coefficient and wear rate of SS 316 sliding against SS 304 under different normal loads are also investigated before and after deposition. The experimental results reveal that improved friction coefficient and wear rate are obtained after deposition as compared to that of before deposition.

scholarly journals Effects of Gas Flow on Spectral Properties of Plasma Jet Induced by Microwave

2018 ◽  
Vol 15 (1) ◽  
pp. 81-86 ◽  
Author(s):  
Baghdad Science Journal
Keyword(s):  
Flow Rate ◽  
Applied Voltage ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Plasma Jet ◽  
Gas Temperature ◽  
Gas Flow Rate ◽  
Argon Gas ◽  
Jet Length ◽  
Maximum Value

In this paper, a construction microwave induced plasma jet(MIPJ) system was used to produce a non-thermal plasma jet at atmospheric pressure, at standard frequency of 2.45 GHz and microwave power of 800 W. The working gas Argon (Ar) was supplied to flow through the torch with adjustable flow rate using flow meter regulator. The influence of the MIPJ parameters such as applied voltage and argon gas flow rate on macroscopic microwave plasma parameters were studied. The macroscopic parameters results show increasing of microwave plasma jet length with increasing of applied voltage, argon gas flow rate where the plasma jet length exceed 12 cm as maximum value. While the increasing of argon gas flow rate will cause increasing into the argon gas temperature, where argon gas temperature the exceed 350 ? as maximum value and study the effect of gas flow rate on the optical properties

The effect of methane gas flow rate on the streamer propagation in an atmospheric-pressure methane-air plasma jet

2018 ◽  
Vol 25 (9) ◽  
pp. 093508 ◽  
Author(s):  
Jinsong Kang ◽  
Muyang Qian ◽  
Gui Li ◽  
Sanqiu Liu ◽  
Chunsheng Ren ◽  
...  
Keyword(s):  
Flow Rate ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Jet ◽  
Air Plasma ◽  
Gas Flow Rate ◽  
Methane Gas ◽  
Streamer Propagation

scholarly journals Electrical and Spectroscopic Diagnostics of Atmospheric Pressure DBD Plasma Jet

2016 ◽  
Vol 40 (1) ◽  
pp. 23-36
Author(s):  
NC Roy ◽  
MR Talukder
Keyword(s):  
Flow Rate ◽  
Applied Voltage ◽  
Atmospheric Pressure ◽  
Gas Flow ◽  
Optical Emission ◽  
Plasma Jet ◽  
Diagnostic Techniques ◽  
Gas Temperature ◽  
Gas Flow Rate ◽  
Dbd Plasma

Atmospheric pressure capillary dielectric barrier oxygen discharge plasma jet is developed to generate nonthermal plasma using unipolar positive pulse power supply. Both electrical and optical diagnostic techniques were used to characterize the produced plasma as functions of applied voltage and gas flow rate. Electrical diagnostics indicated that the discharge frequency decreased with gas flow rate but increased with the applied voltage. Analytical results obtained from the optical emission spectroscopic data revealed the gas temperature, excitation temperature and electron density. Gas temperature was found to decrease with increasing oxygen flow rate but increase linearly with applied voltage. The produced plasma was applied preliminarily to study the inactivation yield of Fusarium oxysporum fungus infected potato samples.Journal of Bangladesh Academy of Sciences, Vol. 40, No. 1, 23-36, 2016

The Effect of Gas Flow Rate on the Thin Film Deposition Rate on Carbon Steel Using Thermal CVD

2011 ◽  
Vol 9 (1) ◽  
Author(s):  
Mohammad A. Chowdhury ◽  
Dewan M. Nuruzzaman ◽  
Mohammad L. Rahaman
Keyword(s):  
Carbon Steel ◽  
Deposition Rate ◽  
Flow Rate ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Chemical Vapor ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Gas Flow Rate ◽  
Film Deposition Rate

Solid thin films have been deposited on carbon steel substrates in a chemical vapor deposition (CVD) reactor where natural gas, mostly methane (CH4), was used as a precursor gas. The effect of gas flow rate on the thin film deposition rate has been investigated experimentally. The effect of gap between activation heater and substrate on the deposition rate has also been observed. To do so, a hot filament thermal chemical vapor deposition unit is used. The flow rate of natural gas varies from 0.5 to 2 l/min at normal temperature and pressure (NTP) and the gap between activation heater and substrate varies from 4 to 6.5 mm. Results show that the deposition rate on carbon steel increases with the increase of gas flow rate. It is also seen that deposition rate increases with the decrease of gap between activation heater and substrate within the observed range. These results are analyzed by dimensional analysis to correlate the deposition rate with gas flow rate, surface roughness and film thickness. In addition, friction coefficient and wear rate of carbon steel sliding against SS 304 under different normal loads are also investigated before and after deposition. The obtained results reveal that in general, the values of friction coefficient and wear rate are lower after deposition than that of before deposition.

scholarly journals Influence of gas flow on argon microwave plasma jet at atmospheric pressure

2011 ◽  
Vol 206 (6) ◽  
pp. 1449-1453 ◽  
Author(s):  
Shouichiro Iio ◽  
Kosuke Yanagisawa ◽  
Chizuru Uchiyama ◽  
Katsuya Teshima ◽  
Naomichi Ezumi ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Microwave Plasma ◽  
Plasma Jet

Facile growth of centimeter-sized single-crystal graphene on copper foil at atmospheric pressure

2015 ◽  
Vol 3 (15) ◽  
pp. 3530-3535 ◽  
Author(s):  
Jing Li ◽  
Xuan-Yun Wang ◽  
Xing-Rui Liu ◽  
Zhi Jin ◽  
Dong Wang ◽  
...  
Keyword(s):  
Single Crystal ◽  
Flow Rate ◽  
Atmospheric Pressure ◽  
Copper Foil ◽  
Gas Flow ◽  
Gas Flow Rate ◽  
Single Crystalline ◽  
Slowing Down ◽  
Cu Foil

By mildly oxidizing Cu foil and slowing down the gas flow rate, centimeter-sized single-crystalline graphene was grown on Cu at atmospheric pressure.

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