scholarly journals Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 269-280
Author(s):  
Masaomi Sanekata ◽  
Hiroshi Nishida ◽  
Yuki Nakagomi ◽  
Yoshihiro Hirai ◽  
Nobuo Nishimiya ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Emission Spectra ◽  
Optical Emission ◽  
Ionic Species ◽  
Gas Pressure ◽  
Pulsed Power ◽  
Generation Process ◽  
Argon Gas ◽  
Pulsed Dc ◽  
Discharge Gas

Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES). Delays in discharge and the formation of comb-like discharge current waveforms due to splitting and pulsing were observed with a decrease in pressure. This observation corresponds to the evolution from MPPMS condition to deep-oscillation-magnetron-sputtering (DOMS)-like condition by changing discharge gas pressure. The optical emission intensities of the ionic species (Ar+ and Ti+) increased as the comb-like current waveforms were formed with decreasing Ar pressure. This behavior showed a marked contrast to that of the neutral species (Ar and Ti). The Ar pressure dependence of OES was revealed to be due to the plasma build-up stage, which is the initial generation process of plasma discharge in pulsed dc magnetron sputtering, from the temporal profile for the atomic-line intensities of the optically emitting species in MPPMS and DOMS-like plasmas.

scholarly journals Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

2018 ◽  
Vol 36 (4) ◽  
pp. 697-703 ◽  
Author(s):  
G.W. Strzelecki ◽  
K. Nowakowska-Langier ◽  
R. Chodun ◽  
S. Okrasa ◽  
B. Wicher ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Optical Emission Spectroscopy ◽  
Film Growth ◽  
Modulation Frequency ◽  
Optical Emission ◽  
Pulsed Power ◽  
Additional Parameter ◽  
The Impact ◽  
Different Levels ◽  
Pulsed Magnetron

AbstractThe research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard unbalanced circular magnetron was conducted in the process of pulsed magnetron sputtering (PMS). It was shown that by using different levels of modulation, the composition of plasma (measured by optical emission spectroscopy, OES) as well as film growth rate and morphology (observed with scanning electron microscope, SEM), can be changed. The impact of modulation is related to the used materials and gases and can vary significantly. It was concluded that modulation frequency can greatly influence the synthesis of materials and can be used as an additional parameter in PMS. Specific relations between modulation frequency and synthesized material require further investigation.

scholarly journals Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering

Coatings ◽  
2020 ◽  
Vol 10 (7) ◽  
pp. 608
Author(s):  
Guang Li ◽  
Yi Xu ◽  
Yuan Xia
Keyword(s):  
Magnetron Sputtering ◽  
Emission Intensity ◽  
Gas Flow ◽  
Optical Emission ◽  
Scratch Test ◽  
Deposition Process ◽  
Plasma Emission ◽  
Cross Sectional ◽  
Pulsed Dc ◽  
Plasma Emission Intensity

A pulsed-dc (direct current) magnetron sputtering with a plasma emission monitor (PEM) system was applied to synthesize Cr-containing hydrogenated amorphous diamond-like carbon (Cr-DLC) films using a large-size industrial Cr target. The plasma emission intensity of a Cr atom at 358 nm wavelength was characterized by optical emission spectrometer (OES). C2H2 gas flow rate was precisely adjusted to obtain a stable plasma emission intensity. The relationships between Cr atom plasma emission intensity and the element concentration, cross-sectional morphology, deposition rate, microstructure, mechanical properties, and tribological properties of Cr-DLC films were investigated. Scanning electron microscope and Raman spectra were employed to analyze the chemical composition and microstructure, respectively. The mechanical and tribological behaviors were characterized and analyzed by using the nano-indentation, scratch test instrument, and ball-on-disk reciprocating friction/wear tester. The results indicate that the PEM system was successfully used in magnetron sputtering for a more stable Cr-DLC deposition process.

Effect of Argon Gas Pressure on Optical Properties of Zinc Oxide Thin Films Deposited by RF Magnetron Sputtering Technique

2014 ◽  
Vol 904 ◽  
pp. 205-208
Author(s):  
J.H. Gu ◽  
Z.Y. Zhong ◽  
S.B. Chen ◽  
C.Y. Yang ◽  
J. Hou
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Refractive Index ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Optical Band Gap ◽  
Rf Magnetron Sputtering ◽  
Gas Pressure ◽  
Argon Gas ◽  
Deposited Films

Zinc oxide (ZnO) thin films were deposited by radio frequency (RF) magnetron sputtering technique on glass substrates in pure argon gas. The optical transmission stectra of the films were measured by ultraviolet-visible spectrophotometer. The effects of argon gas pressure on optical properties of the deposited films were investigated. The optical band-gap of the films was evaluated in terms of the Taucs law. The results show that the argon gas pressure has slightly affected the optical band-gap of the deposited films. Furthermore, the refractive index and extinction coefficient of the films were determined by means of the optical characterization methods. Meanwhile, the dispersion behavior of the refractive index was studied by the single-oscillator model of Wemple and DiDomenico, and the physical parameters of the average oscillator strength, average oscillator wavelength, oscillator energy, the refractive index dispersion parameter and the dispersion energy were obtained.

INVESTIGATION ON OPTICAL EMISSION SPECTRA DURING ECR PLASMA ENHANCED MAGNETRON SPUTTERING CARBON NITRIDE FILM DEPOSITION

2002 ◽  
Vol 16 (06n07) ◽  
pp. 1120-1126 ◽  
Author(s):  
Jun Xu ◽  
Tengcai Ma ◽  
Jialiang Zhang ◽  
Xinlu Deng ◽  
Wenfang Zhang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Emission Spectra ◽  
Optical Emission ◽  
Film Deposition ◽  
Discharge Zone ◽  
Nitride Film ◽  
Plasma Zone ◽  
Ecr Plasma ◽  
Optical Emission Spectra ◽  
Cn Radicals

Emission spectra from the ECR plasma enhanced magnetron sputtering discharge used for CNx film deposition were investigated in the wavelength range 350 – 550 nm. The optical emission spectra from both the negative glow discharge zone near the target surface and the plasma zone formed by ECR discharge and magnetron discharge were studied separately. The dominant chemical species in both zone were found to be N2+, N2* , and CN radicals. But the intensity of CN radical in the plasma zone was greater than that in the negative zone, where an emission band of C2 was detected. The dependence of the intensities of CN band on the working gas pressure was investigated, and the formation of CN radicals, which could be vital in the CNx film deposition process, was discussed. It was shown that a possible mechanism could be the reaction of N2+ and N 2 with C 2 in the gas phase.

Optical emission from pulsed DC magnetron sputtering plasmas

2005 ◽  
Vol 33 (2) ◽  
pp. 348-349 ◽  
Author(s):  
J. Lopez ◽  
WeiDong Zhu ◽  
A. Freilich ◽  
A. Belkind ◽  
K. Becker
Keyword(s):  
Magnetron Sputtering ◽  
Optical Emission ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering
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