scholarly journals Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist

Micromachines ◽  
2018 ◽  
Vol 9 (7) ◽  
pp. 341 ◽  
Author(s):  
Zai-Fa Zhou ◽  
Qing-An Huang
Keyword(s):  
Ultraviolet Lithography ◽  
Lithography Process

In-situ metrology for deep-ultraviolet lithography process control

1998 ◽  
Author(s):  
Nickhil H. Jakatdar ◽  
Xinhui Niu ◽  
John T. Musacchio ◽  
Costas J. Spanos
Keyword(s):  
Process Control ◽  
Ultraviolet Lithography ◽  
Lithography Process ◽  
Deep Ultraviolet ◽  
In Situ Metrology

Salicidation process for submicrometre gate MOSFET fabrication using a resistless electron beam lithography process

1999 ◽  
Vol 35 (15) ◽  
pp. 1283 ◽  
Author(s):  
S. Michel ◽  
E. Lavallée ◽  
J. Beauvais ◽  
J. Mouine
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Lithography Process

Study of Alignment & Overlay Strategy in 14 nm Lithography Process

2020 ◽  
Author(s):  
Lulu Lai ◽  
Rui Qian ◽  
Biqiu Liu ◽  
Xiaobo Guo ◽  
Cong Zhang ◽  
...  
Keyword(s):  
Lithography Process

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

2010 ◽  
Vol 87 (11) ◽  
pp. 2134-2138 ◽  
Author(s):  
Chang Young Jeong ◽  
Sangsul Lee ◽  
Hyun-Duck Shin ◽  
Tae Geun Kim ◽  
Jinho Ahn
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Shadowing Effect

Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

2005 ◽  
Vol 44 (7B) ◽  
pp. 5560-5564 ◽  
Author(s):  
Sang-Ho Lee ◽  
Young-Jae Kang ◽  
Jin-Goo Park ◽  
Ahmed A. Busnaina ◽  
Jong-Myung Lee ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Laser Shock ◽  
Ultraviolet Lithography ◽  
Capping Layer
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