scholarly journals Studying Corrosion Using Miniaturized Particle Attached Working Electrodes and the Nafion Membrane

Micromachines ◽  
2021 ◽  
Vol 12 (11) ◽  
pp. 1414
Author(s):  
Jiyoung Son ◽  
Edgar C. Buck ◽  
Shawn L. Riechers ◽  
Shalini Tripathi ◽  
Lyndi E. Strange ◽  
...  
Keyword(s):  
Electrochemical Performance ◽  
Photoelectron Spectroscopy ◽  
Focused Ion Beam ◽  
Secondary Ion Mass Spectrometry ◽  
Ion Beam ◽  
Nafion Membrane ◽  
New Approach ◽  
Force Microscopy ◽  
Atomic Force ◽  
Secondary Ion

We developed a new approach to attach particles onto a conductive layer as a working electrode (WE) in a microfluidic electrochemical cell with three electrodes. Nafion, an efficient proton transfer molecule, is used to form a thin protection layer to secure particle electrodes. Spin coating is used to develop a thin and even layer of Nafion membrane. The effects of Nafion (5 wt% 20 wt%) and spinning rates were evaluated using multiple sets of replicates. The electrochemical performance of various devices was demonstrated. Additionally, the electrochemical performance of the devices is used to select and optimize fabrication conditions. The results show that a higher spinning rate and a lower Nafion concentration (5 wt%) induce a better performance, using cerium oxide (CeO2) particles as a testing model. The WE surfaces were characterized using atomic force microscopy (AFM), scanning electron microscopy-focused ion beam (SEM-FIB), time-of-flight secondary ion mass spectrometry (ToF-SIMS), and X-ray photoelectron spectroscopy (XPS). The comparison between the pristine and corroded WE surfaces shows that Nafion is redistributed after potential is applied. Our results verify that Nafion membrane offers a reliable means to secure particles onto electrodes. Furthermore, the electrochemical performance is reliable and reproducible. Thus, this approach provides a new way to study more complex and challenging particles, such as uranium oxide, in the future.

Guided Control of Cu2O Nanodot Self-Assembly on SrTiO3 (100)

2004 ◽  
Vol 811 ◽  
Author(s):  
Yingge Du ◽  
Surajit Atha ◽  
Robert Hull ◽  
James F. Groves ◽  
Igor Lyubinetsky ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Self Assembly ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Photocatalytic Decomposition ◽  
Process Conditions ◽  
Photochemical Process ◽  
Force Microscopy ◽  
Atomic Force

ABSTRACTA method has been developed for specifying the growth location of Cu2O nanodotson SrTiO3 (100) substrates. Growth location has been specified by using a focused ion beam (FIB) to modify microscopic and nanoscopic regions of the SrTiO3substrate prior to Cu2O deposition. Deposition onto the modified regions under carefully selected process conditions has generated nanodot growth at the edge of microscopic FIB-induced features and on top of nanoscopic FIB-induced features. For this work, an array of evenly spaced FIB implants was first patterned into several regions of each substrate. Within each sub-division of the array, the FIB implants were identical in Ga+ energy and dosage and implant diameter and spacing. After FIB surface modification and subsequent in-situ substrate cleaning, Cu2O nanodots were synthesized on the patterned SrTiO3 substrates using oxygen plasma assisted molecular beam epitaxy. The substrates and nanodots were characterized using atomic force microscopy at various stages of the process; in-situ X-ray photoelectron spectroscopy and Auger electron spectroscopy analysis demonstrated that the final stoichiometry of the nanodots was Cu2O. The photocatalytic decomposition of water on Cu2O under visible light irradiation has been reported. If the Cu2O can be located in the form ofislands on a carefully selected substrate, then it could be possible to greatly enhance the efficiency of the photochemical process.

scholarly journals The Oleofobization of Paper via Plasma Treatment

Polymers ◽  
2021 ◽  
Vol 13 (13) ◽  
pp. 2148
Author(s):  
Matic Resnik ◽  
Eva Levičnik ◽  
Žiga Gosar ◽  
Rok Zaplotnik ◽  
Janez Kovač ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
Surface Characteristics ◽  
High Volume ◽  
Barrier Properties ◽  
Contact Angles ◽  
Plasma Reactors ◽  
Force Microscopy ◽  
Atomic Force ◽  
Secondary Ion

Cellulose is a promising biomass material suitable for high volume applications. Its potential lies in sustainability, which is becoming one of the leading trends in industry. However, there are certain drawbacks of cellulose materials which limit their use, especially their high wettability and low barrier properties, which can be overcome by applying thin coatings. Plasma technologies present a high potential for deposition of thin environmentally friendly and recyclable coatings. In this paper, two different plasma reactors were used for coating two types of cellulose-based substrates with hexamethyldisiloxane (HMDSO). The changes in surface characteristics were measured by atomic force microscopy (AFM), scanning electron microscopy (SEM), surface free energy and contact angles measurements, X-ray photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS). Successful oleofobization was observed for an industrial scale reactor where pure HMDSO was used in the absence of oxygen.

Superhydrophobic and Corrosion Protective Coating on Aluminium

2018 ◽  
Vol 941 ◽  
pp. 1662-1667
Author(s):  
Ana Maria Escobar Romero ◽  
Oriol Rius-Ayra ◽  
Núria Llorca-Isern ◽  
Elisa Valles Gimenez ◽  
Albert Serrà i Ramos
Keyword(s):  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
Hierarchical Structures ◽  
Superhydrophobic Surfaces ◽  
Force Microscopy ◽  
Anodization Time ◽  
Atomic Force ◽  
Fluorine Compounds ◽  
Reaction Proceeds ◽  
Secondary Ion

Industrial application of superhydrophobic surfaces is limited by the unsatisfactory mechanical properties of the material. Combining chemical etching and anodization terraced features containing aluminium oxide on different aluminium alloy surfaces were produced. After modified by fatty acid, the surfaces were superhydrophobic and they showed self-cleaning effect. The highest contact angle was obtained after forming hierarchical structures with a solution free of fluorine compounds; therefore, the process is considered eco-friendly. The alumina formed in the coating process promotes an improved corrosion resistance. The present study has three main objectives: to identify the molecules responsible for superhydrophobicity, the mechanism by which superhydrophobicity is produced, and consequently the influence of variables such as anodization time on the proposed processing method. We use time-of-flight secondary ion mass spectrometry (TOF-SIMS) and X-ray photoelectron spectroscopy (XPS) techniques to identify each compound involved in the final surface, by paying close attention to the analysis of the mechanism by which the chemical reaction proceeds. The morphology of the superhydrophobic surfaces was further observed by scanning electron microscope (SEM) and atomic force microscopy and was used to elucidate the effect of the anodization time in the properties of the superhydrophobic material.

scholarly journals Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum

Coatings ◽  
2020 ◽  
Vol 10 (10) ◽  
pp. 954
Author(s):  
Rashid Dallaev ◽  
Dinara Sobola ◽  
Pavel Tofel ◽  
Ľubomir Škvarenina ◽  
Petr Sedlák
Keyword(s):  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
Atomic Layer ◽  
Nitrogen Atmosphere ◽  
Force Microscopy ◽  
Atomic Force ◽  
Layer Deposition ◽  
Secondary Ion

The aim of this study is motivated by the pursuit to investigate the performance of new and as yet untested precursors such as hydrazinium chloride (N2H5Cl) and triisobutylaluminum Al(C4H9)3 in the AlN atomic layer deposition (ALD) process as well as to study effects of successive annealing on the quality of the resulting layer. Both precursors are significantly cheaper than their conventional counterparts while also being widely available and can boast easy handling. Furthermore, Al(C4H9)3 being a rather large molecule might promote steric hindrance and prevent formation of undesired hydrogen bonds. Chemical analysis is provided by X-ray photoelectron spectroscopy (XPS) and secondary-ion mass spectrometry (SIMS) techniques; surface morphology was studied using atomic force microscopy (AFM). Chlorine containing precursors such as AlCl3 are usually avoided in ALD process due to the risk of chamber contamination. However, experimental data of this study demonstrated that the use of N2H5Cl does not result in chlorine contamination due to the fact that temperature needed for HCl molecules to become reactive cannot be reached within the AlN ALD window (200–350 °C). No amount of chlorine was detected even by the most sensitive techniques such as SIMS, meaning it is fully removed out of the chamber during purge stages. A part of the obtained samples was subjected to annealing (1350 °C) to study effects of high-temperature processing in nitrogen atmosphere, the comparisons with unprocessed samples are provided.

scholarly journals Orthogonal chemical functionalization of patterned gold on silica surfaces

2015 ◽  
Vol 6 ◽  
pp. 2272-2277 ◽  
Author(s):  
Francisco Palazon ◽  
Didier Léonard ◽  
Thierry Le Mogne ◽  
Francesca Zuttion ◽  
Céline Chevalier ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
Single Step ◽  
Chemical Functionalization ◽  
Force Microscopy ◽  
Silica Substrate ◽  
Silica Surfaces ◽  
Atomic Force ◽  
Target Molecules ◽  
Secondary Ion

Single-step orthogonal chemical functionalization procedures have been developed with patterned gold on silica surfaces. Different combinations of a silane and a thiol were simultaneously deposited on a gold/silica heterogeneous substrate. The orthogonality of the functionalization (i.e., selective grafting of the thiol on the gold areas and the silane on the silica) was demonstrated by X-ray photoelectron spectroscopy (XPS) as well as time-of-flight secondary ion mass spectrometry (ToF–SIMS) mapping. The orthogonal functionalization was used to immobilize proteins onto gold nanostructures on a silica substrate, as demonstrated by atomic force microscopy (AFM). These results are especially promising in the development of future biosensors where the selective anchoring of target molecules onto nanostructured transducers (e.g., nanoplasmonic biosensors) is a major challenge.

Dielectric Properties of Thermally Grown SiO2 on 4H-SiC(0001) Substrates

2013 ◽  
Vol 740-742 ◽  
pp. 605-608 ◽  
Author(s):  
Takuji Hosoi ◽  
Yusuke Uenishi ◽  
Shuhei Mitani ◽  
Yuki Nakano ◽  
Takashi Nakamura ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Secondary Ion Mass Spectrometry ◽  
Oxide Thickness ◽  
Force Microscopy ◽  
Atomic Force ◽  
Capacitance Voltage ◽  
Linear Fit ◽  
Low Permittivity ◽  
Secondary Ion ◽  
Thermally Grown

The bulk properties of thermally grown SiO2 on 4H-SiC(0001) substrates were thoroughly investigated by capacitance-voltage (C-V) measurement, atomic force microscopy (AFM), spectroscopic ellipsometry (SE), x-ray photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS). The equivalent oxide thickness (EOT) extracted from the capacitance-voltage (C-V) characteristics of TiN/SiO2 capacitors was proportional to the physical thickness (Tphys), but the slope of the linear fit was found to be 1.11, indicating that the permittivity of SiO2 on 4H-SiC formed by thermal oxidation is only about 3.5, which is lower than the commonly accepted value of 3.9. Since XPS analysis revealed that the oxide of SiC was stoichiometric and the atomic concentration of residual carbons in the oxide measured by SIMS was sufficiently low (1017 cm-3), the low permittivity of thermal oxides of 4H-SiC may originate from the reduced bulk density, which can be predicted by the Clausius-Mossotti relation.

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