scholarly journals Shrinkage-Considered Mold Design for Improvement of Micro/Nano-Structured Optical Element Performance

Micromachines ◽  
2020 ◽  
Vol 11 (10) ◽  
pp. 941 ◽  
Author(s):  
Minsu Kim ◽  
Eun Song Oh ◽  
Moon Kyu Kwak
Keyword(s):  
Optical Element ◽  
Master Mold ◽  
Optical Performance ◽  
Optical Elements ◽  
Manufacturing Method ◽  
Two Photon ◽  
Quality Product ◽  
Critical Issues ◽  
Micro Lens Array ◽  
Polymer Shrinkage

Polymer shrinkage in nano-imprint lithography (NIL) is one of the critical issues that must be considered in order to produce a quality product. Especially, this condition should be considered during the manufacture of optical elements, because micro/nano-structured optical elements should be controlled to fit the desired shape in order to achieve the intended optical performance. In this paper, during NIL, we characterized the shrinkage of polymeric resin on micro lens array (MLA), which is one of the representative micro/nano-structured optical elements. The curvature shape and optical performance of MLA were measured to check the shrinkage tendency during the process. The master mold of MLA was generated by the two-photon polymerization (2PP) additive manufacturing method, and the tested samples were replicated from the master mold with NIL. Several types of resin were adjusted to prepare the specimens, and the shrinkage effects in each case were compared. The shrinkage showed different trends based on the NIL materials and MLA shapes. These characterizations can be applied to compensate for the MLA design, and the desired performance of MLA products can be achieved with a corrected master mold.

scholarly journals Nanooptical elements for visual verification

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Alexander Goncharsky ◽  
Anton Goncharsky ◽  
Dmitry Melnik ◽  
Svyatoslav Durlevich
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Mass Production ◽  
Optical Element ◽  
Visual Image ◽  
Zero Order ◽  
Diffractive Optical Elements ◽  
Optical Elements ◽  
Standard Equipment ◽  
Diffractive Element

AbstractThis paper focuses on the development of flat diffractive optical elements (DOEs) for protecting banknotes, documents, plastic cards, and securities against counterfeiting. A DOE is a flat diffractive element whose microrelief, when illuminated by white light, forms a visual image consisting of several symbols (digits or letters), which move across the optical element when tilted. The images formed by these elements are asymmetric with respect to the zero order. To form these images, the microrelief of a DOE must itself be asymmetric. The microrelief has a depth of ~ 0.3 microns and is shaped with an accuracy of ~ 10–15 nm using electron-beam lithography. The DOEs developed in this work are securely protected against counterfeiting and can be replicated hundreds of millions of times using standard equipment meant for the mass production of relief holograms.

ontrolled implementation of two-photon controlled phase gate within a network

2010 ◽  
Vol 10 (9&10) ◽  
pp. 821-828
Author(s):  
Yan Xia ◽  
Jie Song ◽  
Zhen-Biao Yang ◽  
Shi-Biao Zheng
Keyword(s):  
Quantum Computer ◽  
Photon Detectors ◽  
Optical Elements ◽  
Experimental Realization ◽  
Two Photon ◽  
Phase Gate ◽  
Controlled Phase Gate ◽  
Linear Optical ◽  
Polarized Photons ◽  
Linear Optical Elements

We propose a protocol to controlled implement the two-photon controlled phase gate within a network by using interference of polarized photons. The realization of this protocol is appealing due to the fact that the quantum state of light is robust against the decoherence, and photons are ideal carriers for transmitting quantum information over long distances. The proposed setup involves simple linear optical elements and the conventional photon detectors that only distinguish the vacuum and nonvacuum Fock number states. This can greatly simplify the experimental realization of a linear optical quantum computer.

Complex optical elements for scanning helium microscopy through 3D printing

2021 ◽  
Author(s):  
Matthew Bergin ◽  
Thomas Myles ◽  
Aleksandar Radić ◽  
Christopher Hatchwell ◽  
Sam Lambrick ◽  
...  
Keyword(s):  
3D Printing ◽  
Multiple Scattering ◽  
Low Cost ◽  
Optical Element ◽  
Next Generation ◽  
Background Signal ◽  
Optical Elements ◽  
Cost Components

Abstract Developing the next generation of scanning helium microscopes requires the fabrication of optical elements with complex internal geometries. We show that resin stereolithography (SLA) 3D printing produces low-cost components with the requisite convoluted structures whilst achieving the required vacuum properties, even without in situ baking. As a case study, a redesigned pinhole plate optical element of an existing scanning helium microscope was fabricated using SLA 3D printing. In comparison to the original machined component, the new optical element minimised the key sources of background signal, in particular multiple scattering and the secondary effusive beam.

Enhanced depth-of-field of an integral imaging microscope using a bifocal holographic optical element-micro lens array

2017 ◽  
Vol 42 (16) ◽  
pp. 3209 ◽  
Author(s):  
Ki-Chul Kwon ◽  
Young-Tae Lim ◽  
Chang-Won Shin ◽  
Munkh-Uchral Erdenebat ◽  
Jae-Moon Hwang ◽  
...  
Keyword(s):  
Optical Element ◽  
Depth Of Field ◽  
Integral Imaging ◽  
Lens Array ◽  
Holographic Optical Element ◽  
Micro Lens Array ◽  
Micro Lens

A simple optical system delivering a tunable micrometer pink beam that can compensate for heat-induced deformations

2015 ◽  
Vol 22 (4) ◽  
pp. 930-935 ◽  
Author(s):  
Ruben Reininger ◽  
Zunping Liu ◽  
Gilles Doumy ◽  
Linda Young
Keyword(s):  
Optical System ◽  
Heat Load ◽  
Optical Element ◽  
High Energy ◽  
Angle Of Incidence ◽  
Optical Elements ◽  
Source Distance ◽  
Energy Cutoff ◽  
Working Distance ◽  
Photon Source

The radiation from an undulator reflected from one or more optical elements (usually termed `pink-beam') is used in photon-hungry experiments. The optical elements serve as a high-energy cutoff and for focusing purposes. One of the issues with this configuration is maintaining the focal spot dimension as the energy of the undulator is varied, since this changes the heat load absorbed by the first optical element. Finite-element analyses of the power absorbed by a side water-cooled mirror exposed to the radiation emitted by an undulator at the Advanced Photon Source (APS) and at the APS after the proposed upgrade (APSU) reveals that the mirror deformation is very close to a convex cylinder creating a virtual source closer to the mirror than the undulator source. Here a simple optical system is described based on a Kirkpatrick–Baez pair which keeps the focus size to less than 2 µm (in the APSU case) with a working distance of 350 mm despite the heat-load-induced change in source distance. Detailed ray tracings at several photon energies for both the APS and APSU show that slightly decreasing the angle of incidence on the mirrors corrects the change in the `virtual' position of the source. The system delivers more than 70% of the first undulator harmonic with very low higher-orders contamination for energies between 5 and 10 keV.

scholarly journals On a problem of the synthesis of binary nano-optical elements

2016 ◽  
pp. 415-424
Author(s):  
А.А. Гончарский ◽  
С.Ю. Серёжников
Keyword(s):  
Electron Beam ◽  
Augmented Reality ◽  
Electron Beam Lithography ◽  
Optical Element ◽  
Diffractive Optical Elements ◽  
Partial Loss ◽  
Optical Elements ◽  
Optical Images ◽  
Augmented Reality Technology ◽  
Security Label

В рамках широко распространенной технологии Augmented Reality обсуждается возможность контроля подлинности защитных оптических меток на основе бинарных нанооптических элементов. С помощью смартфона фотографируют изображение защитной метки. Полученное изображение интерпретируется как дифракционный оптический элемент. В приближении Френеля рассчитывают изображение, формируемое дифракционным оптическим элементом, которое используют для идентификации подлинности защитной метки. Защитная метка представляет собой фазовый оптический элемент, глубина микрорельефа которого не превышает 0.5 мкм. Нанооптические элементы изготавливаются с помощью электроннолучевой литографии. Разработанные нанооптические элементы устойчивы к частичному повреждению микрорельефа и могут быть использованы для идентификации банкнот, документов и др. This paper deals with optical security label identification technology as a part of augmented reality technology. Security labels are based on binary nanooptical elements and are photographed using a smartphone. Photographed images are interpreted as diffractive optical elements. Optical images formed by these diffractive elements are computed using the Fresnel approximation. These images are used to identify the security labels. A security label consists of a phase optical element whose microrelief height is of no more than 0.5 $\mu$m. Nanooptical elements are manufactured using electron-beam lithography. The optical security labels are resistant against microrelief damages and can withstand partial loss of an image. The optical elements developed can be used to protect and identify banknotes, documents, etc.

scholarly journals CALCULATION OF THE ACHROMATIC DIFFRACTION SYSTEM WITH CORRECTED SPHERICAL ABERRATION (part 2)

2020 ◽  
Vol 8 (1) ◽  
pp. 127-133
Author(s):  
Yury Ts. Batomunkuev ◽  
Alexandra A. Pechenkina
Keyword(s):  
Spherical Aberration ◽  
Focal Length ◽  
Optical Element ◽  
Diffraction Order ◽  
Image Plane ◽  
Chromatic Aberration ◽  
Real Image ◽  
Optical Elements ◽  
A Value ◽  
Analytical Expressions

Achromatization of a three-component diffraction system consisting of one thick and two thin hologram optical elements is considered in the work. Analytical expressions are obtained for correcting the chromatic aberration of the position of a thick focusing hologram optical element by two scattering thin hologram optical elements in a given spectrum range. It is shown that achromatization is achieved for such a three-component system using two thin hologram elements located symmetrically on both sides of the thick element and having a value of the working diffraction order greater than the ratio of the focal length to the distance from the thin element to the image plane (at a given wavelength). The proposed three-component holographic system can be used to convert both an imaginary image into a real image and a real into an imaginary image in predetermined spectral regions of the visible, ultraviolet or infrared ranges of the spectrum.

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