Incorporation of Phosphorus Impurities in a Silicon Nanowire Transistor with a Diameter of 5 nm
Keyword(s):
20 Nm
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Silicon nanowire (SiNW) is always accompanied by severe impurity segregation and inhomogeneous distribution, which deteriorates the SiNWs electrical characteristics. In this paper, a method for phosphorus doping incorporation in SiNW was proposed using plasma. It showed that this method had a positive effect on the doping concentration of the wires with a diameter ranging from 5 nm to 20 nm. Moreover, an SiNW transistor was assembled based on the nanowire with a 5 nm diameter. The device’s ION/IOFF ratio reached 104. The proposed incorporation method could be helpful to improve the effect of the dopants in the silicon nanowire at a nanometer scale.
2021 ◽
Vol 20
(03)
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Keyword(s):
2018 ◽
Vol 33
(10)
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pp. 105009
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2021 ◽
Vol 21
(8)
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pp. 4330-4335
Keyword(s):
2014 ◽
Vol 2
(29)
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pp. 11261
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