scholarly journals Conduction Mechanisms in Resistance Switching Memory Devices Using Transparent Boron Doped Zinc Oxide Films

Materials ◽  
2014 ◽  
Vol 7 (11) ◽  
pp. 7339-7348 ◽  
Author(s):  
Fu-Chien Chiu
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
Resistance Switching ◽  
Memory Devices ◽  
Zinc Oxide Films ◽  
Boron Doped ◽  
Conduction Mechanisms ◽  
Switching Memory

scholarly journals Improved properties of boron-doped zinc oxide films with In2O3：Sn interlayers for solar cells

2014 ◽  
Vol 63 (5) ◽  
pp. 056801
Author(s):  
Zhao Hui-Xu ◽  
Chen Xin-Liang ◽  
Yang Xu ◽  
Du Jian ◽  
Bai Li-Sha ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Solar Cells ◽  
Oxide Films ◽  
Zinc Oxide Films ◽  
Boron Doped

Transparent boron-doped zinc oxide films for antibacterial and magnetic applications

2020 ◽  
Vol 31 (14) ◽  
pp. 11911-11926 ◽  
Author(s):  
Zohra Nazir Kayani ◽  
Zainab Bashir ◽  
Saira Riaz ◽  
Shahzad Naseem ◽  
Zeb Saddiqe
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
Zinc Oxide Films ◽  
Boron Doped ◽  
Magnetic Applications

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

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