Electrical Performance and Reliability Improvement of Amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors with HfO2 Gate Dielectrics by CF4 Plasma Treatment
2011 ◽
Vol 32
(1)
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pp. 42-44
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2015 ◽
Vol 135
(6)
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pp. 192-198
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2011 ◽
Vol 50
(3)
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pp. 03CB06
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2009 ◽
Vol 3
(7-8)
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pp. 239-241
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2014 ◽
Vol 53
(4S)
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pp. 04EF07
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