scholarly journals An Advanced Characterization Method for the Elastic Modulus of Nanoscale Thin-Films Using a High-Frequency Micromechanical Resonator

Materials ◽  
2017 ◽  
Vol 10 (7) ◽  
pp. 806 ◽  
Author(s):  
Yun Young Kim
2019 ◽  
pp. 20-25
Author(s):  
Anna Chlenova ◽  
◽  
Elizaveta Golubeva ◽  
Iuliia Novoselova ◽  
Ruslan Salikhov ◽  
...  

Materials ◽  
2021 ◽  
Vol 14 (12) ◽  
pp. 3360
Author(s):  
Yakir Dahan ◽  
Eldad Holdengreber ◽  
Elichai Glassner ◽  
Oz Sorkin ◽  
Shmuel E. Schacham ◽  
...  

A new measurement technique of electrical parameters of superconducting thin films at the Very High Frequency (VHF) range is described, based on resonators with microstrip (MS) structures. The design of an optimal resonator was achieved, based on a thorough theoretical analysis, which is required for derivation of the exact configuration of the MS. A theoretical model is presented, from which an expression for the attenuation of a MS line can be derived. Accordingly, simulations were performed, and an optimal resonator for the VHF range was designed and implemented. Production constraints of YBa2Cu3O7 (YBCO) limited the diameter of the sapphire substrate to 3″. Therefore, a meander configuration was formed to fit the long λ/4 MS line on the wafer. By measuring the complex input reflection coefficients of a λ/4 resonator, we extracted the quality factor, which is mainly affected by the dielectric and conductor attenuations. The experimental results are well fitted by the theoretical model. The dielectric attenuation was calculated using the quasi-static analysis of the MS line. An identical copper resonator was produced and measured to compare the properties of the YBCO resonator in reference to the copper one. A quality factor of ~6·105 was calculated for the YBCO resonator, three orders of magnitude larger than that of the copper resonator. The attenuation per unit length of the YBCO layer was smaller by more than five orders of magnitude than that of the copper.


2021 ◽  
Vol 118 (10) ◽  
pp. 102901
Author(s):  
Shelby S. Fields ◽  
David H. Olson ◽  
Samantha T. Jaszewski ◽  
Chris M. Fancher ◽  
Sean W. Smith ◽  
...  

Author(s):  
Taylor C. Stimpson ◽  
Daniel A. Osorio ◽  
Emily D. Cranston ◽  
Jose M. Moran-Mirabal
Keyword(s):  

2009 ◽  
Vol 42 (17) ◽  
pp. 175506 ◽  
Author(s):  
Xiu-Peng Zheng ◽  
Yan-Ping Cao ◽  
Bo Li ◽  
Xi-Qiao Feng ◽  
Hanqing Jiang ◽  
...  

2007 ◽  
Vol 40 (22) ◽  
pp. 7755-7757 ◽  
Author(s):  
Jong-Young Lee ◽  
Kristin E. Su ◽  
Edwin P. Chan ◽  
Qingling Zhang ◽  
Todd Emrick ◽  
...  

2011 ◽  
Vol 495 ◽  
pp. 108-111 ◽  
Author(s):  
Vasiliki P. Tsikourkitoudi ◽  
Elias P. Koumoulos ◽  
Nikolaos Papadopoulos ◽  
Costas A. Charitidis

The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4thin films on SiO2and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The produced thin films are characterized using nanoindentation technique and their nanomechanical properties (hardness and elastic modulus) are obtained. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure.


2019 ◽  
Vol 669 ◽  
pp. 520-524
Author(s):  
Baptiste Bérenguier ◽  
Nicolas Barreau ◽  
Alexandre Jaffre ◽  
Daniel Ory ◽  
Jean-François Guillemoles ◽  
...  

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