scholarly journals ZnO as a Functional Material, a Review

Crystals ◽  
2019 ◽  
Vol 9 (10) ◽  
pp. 505 ◽  
Author(s):  
Michał A. Borysiewicz

Zinc oxide (ZnO) is a fascinating wide band gap semiconductor material with many properties that make it widely studied in the material science, physics, chemistry, biochemistry, and solid-state electronics communities. Its transparency, possibility of bandgap engineering, the possibility to dope it into high electron concentrations, or with many transition or rare earth metals, as well as the many structures it can form, all explain the intensive interest and broad applications. This review aims to showcase ZnO as a very versatile material lending itself both to bottom-up and top-down fabrication, with a focus on the many devices it enables, based on epitaxial structures, thin films, thick films, and nanostructures, but also with a significant number of unresolved issues, such as the challenge of efficient p-type doping. The aim of this article is to provide a wide-ranging cross-section of the current state of ZnO structures and technologies, with the main development directions underlined, serving as an introduction, a reference, and an inspiration for future research.

2011 ◽  
Vol 5 (4) ◽  
pp. 153-155 ◽  
Author(s):  
Seiji Yamazoe ◽  
Shunsuke Yanagimoto ◽  
Takahiro Wada
Keyword(s):  
Band Gap ◽  

2009 ◽  
Vol 95 (17) ◽  
pp. 172109 ◽  
Author(s):  
Anderson Janotti ◽  
Eric Snow ◽  
Chris G. Van de Walle

2009 ◽  
Vol 94 (20) ◽  
pp. 202103 ◽  
Author(s):  
Min-Ling Liu ◽  
Fu-Qiang Huang ◽  
Li-Dong Chen ◽  
I-Wei Chen

Author(s):  
V.A. Dmitriev

Wide band gap nitrides(InN, GaN, AlN) have been considered promising optoelectronics materials for many years [1]. Recently two main technological problems in the nitrides were overcome: (1)high quality layers has been grown on both sapphire and SiC substrates and(2) p-type GaN and AlGaN material has been obtained. These achievements resulted in the fabrication of bright light emitters in the violet, blue and green spectral regions [2].First injection laser has been demonstrated [3]. This paper reviews results obtained over the last few years on nitride p-n junctions, particularly on GaN based p-n junctions grown on SiC substrates. We will consider GaN p-n junctions, AlGaN p-n junctions, GaN and AlGaN p-i-n structures, and, finally, GaN/SiC p-n structures.


2013 ◽  
Vol 717 ◽  
pp. 205-209 ◽  
Author(s):  
Yuan Yuan Sun ◽  
Xi He Zhang ◽  
Qiu Rui Jia ◽  
Zheng Li ◽  
Shi Bo Liu

GaN semiconductor was one of the most promising semiconductor materials with direct wide band gap transition. It was regarded as one of the most desirable materials to prepare short wavelength optoelectronic devices for the good optoelectronic properties and excellent mechanical behavior. In this paper, n and p-type GaN films were prepared on Al2O3 substrates by MOCVD. Through the optimization of parameters, we obtained effective in doped Mg and carrier concentration for 1019. MSM structural ultraviolet photoelectric devices were prepared on GaN film by two step epitaxy growth method. The highest transmittance and best epitaxial growth quality has been gained at 570°C for buffer layer of the samples.


2018 ◽  
Vol 57 (19) ◽  
pp. 11874-11883 ◽  
Author(s):  
Christos A. Tzitzeklis ◽  
Jyoti K. Gupta ◽  
Matthew S. Dyer ◽  
Troy D. Manning ◽  
Michael J. Pitcher ◽  
...  

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KC07 ◽  
Author(s):  
Hiroshi Sakakima ◽  
Mikihiko Nishitani ◽  
Koichi Yamamoto ◽  
Takahiro Wada

2003 ◽  
Vol 82 (17) ◽  
pp. 2814-2816 ◽  
Author(s):  
Hiroshi Yanagi ◽  
Janet Tate ◽  
Sangmoon Park ◽  
Cheol-Hee Park ◽  
Douglas A. Keszler

2009 ◽  
Vol 10 (5) ◽  
pp. 932-938 ◽  
Author(s):  
Michael Kröger ◽  
Sami Hamwi ◽  
Jens Meyer ◽  
Thomas Riedl ◽  
Wolfgang Kowalsky ◽  
...  

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