scholarly journals Morphology of Diamond Layers Grown on Different Facets of Single Crystal Diamond Substrates by a Microwave Plasma CVD in CH4-H2-N2 Gas Mixtures

Crystals ◽  
2017 ◽  
Vol 7 (6) ◽  
pp. 166 ◽  
Author(s):  
Evgeny Ashkinazi ◽  
Roman Khmelnitskii ◽  
Vadim Sedov ◽  
Andrew Khomich ◽  
Alexander Khomich ◽  
...  
Keyword(s):  
Single Crystal ◽  
Microwave Plasma ◽  
Gas Mixtures ◽  
Plasma Cvd ◽  
Single Crystal Diamond ◽  
Microwave Plasma Cvd

Epitaxial Growth of Diamond by In-Liquid Plasma CVD Method

2017 ◽  
Vol 749 ◽  
pp. 211-216
Author(s):  
Pria Gautama ◽  
Hiromichi Toyota ◽  
Xia Zhu ◽  
Yukiharu Iwamoto ◽  
Shinfuku Nomura ◽  
...  
Keyword(s):  
Single Crystal ◽  
Epitaxial Growth ◽  
Diamond Film ◽  
High Speed ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Tungsten Electrode ◽  
Experimental Conditions ◽  
Single Crystal Diamond ◽  
Microwave Plasma Cvd

Currently, novel method to synthesize diamond film on material substrate called as in-liquid microwave plasma CVD (IL-MPCVD) has been achieved. It has been studied and improved in addition expected as new method instead of conventional gas phase microwave plasma CVD (MPCVD). The purpose of this study is to synthesize single crystal diamond using IL-MPCVD in high speed deposition. The experimental conditions, methanol was poured in to the reactor. Each of diamond particles (100) and (111) was embedded on the stainless steel substrates (SUS632J2). It was mounted to the substrate holder of in-liquid plasma equipment and installed on the top cover. The distance between the tip of the electrode and the substrate was kept to 1.5mm. A microwave of 2.45GHz was irradiated into the quartz glass tube reactor from the rectangular cavity resonator with 4 mm diameter tungsten electrode and the plasma was generated at its tip. The microwave was adjusted in appropriate power to maintain a certain substrate temperature. Diamond films were evaluated by Raman spectroscopy, Scanning Electron Microscope (SEM) and Laser Microscope (LM). As a result, the best orientation for epitaxial growth was found to be (100) which have film growth gradually and smooth surface. Whereas (111) face has polycrystalline film with irregularity growth and rough surface. The remaining H and C after CO synthesis satisfying H/C>20 is necessary to synthesized diamond using IL-MPCVD. The deposition rate was about 32 μm/h when both single crystal and polycrystalline diamond film were synthesized.

Factors to control uniformity of single crystal diamond growth by using microwave plasma CVD

2016 ◽  
Vol 63 ◽  
pp. 17-20 ◽  
Author(s):  
Hideaki Yamada ◽  
Akiyoshi Chayahara ◽  
Shinya Ohmagari ◽  
Yohiaki Mokuno
Keyword(s):  
Single Crystal ◽  
Microwave Plasma ◽  
Diamond Growth ◽  
Plasma Cvd ◽  
Single Crystal Diamond ◽  
Microwave Plasma Cvd

Large Single Crystal Diamond Plates Produced by Microwave Plasma CVD

2009 ◽  
Vol 615-617 ◽  
pp. 991-994 ◽  
Author(s):  
Yoshiaki Mokuno ◽  
Akiyoshi Chayahara ◽  
Hideaki Yamada ◽  
Nobuteru Tsubouchi
Keyword(s):  
Single Crystal ◽  
Microwave Plasma ◽  
Cvd Diamond ◽  
Plasma Cvd ◽  
Large Single Crystal ◽  
Single Crystal Diamond ◽  
Microwave Plasma Cvd ◽  
Recent Developments ◽  
Lift Off ◽  
Bulk Diamond

Recent developments in producing large single crystal CVD diamond plates are reviewed. The developments consist of synthesis of large single crystal diamond and production of single crystal diamond plates from the bulk diamond by the lift-off process. Combining these developments, half-inch single crystal CVD diamond plates have been successfully produced.

Co-deposition of diamond and β-SiC by microwave plasma CVD in H2-CH4-SiH4 gas mixtures

2019 ◽  
Vol 98 ◽  
pp. 107520 ◽  
Author(s):  
V.S. Sedov ◽  
A.K. Martyanov ◽  
A.A. Khomich ◽  
S.S. Savin ◽  
V.V. Voronov ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Gas Mixtures ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd
Sign in / Sign up

Export Citation Format

Share Document