scholarly journals Optical and Microstructural Characterization of Thin Layers

Crystals ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 749
Author(s):  
Łukasz Skowroński
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Microstructural Characterization ◽  
Growth Conditions ◽  
Thin Layers ◽  
Special Issue

The microstructure and optical properties of layers strongly depend on the method of synthesis. This Special Issue on “Optical and Microstructural Characterization of Thin Layers” is a collection of papers on the relationships between the growth conditions and specific properties of thin films.

scholarly journals Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD

2016 ◽  
Vol 19 (suppl 1) ◽  
pp. 97-102 ◽  
Author(s):  
Karen Alejandra Chavarría-Castillo ◽  
Patricia Amézaga-Madrid ◽  
Oswaldo Esquivel-Pereyra ◽  
Wilber Antúnez-Flores ◽  
Pedro Pizá Ruiz ◽  
...  
Keyword(s):  
Thin Films ◽  
Microstructural Characterization

Electrochemical deposition and microstructural characterization of AlCrFeMnNi and AlCrCuFeMnNi high entropy alloy thin films

2015 ◽  
Vol 358 ◽  
pp. 533-539 ◽  
Author(s):  
V. Soare ◽  
M. Burada ◽  
I. Constantin ◽  
D. Mitrică ◽  
V. Bădiliţă ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrochemical Deposition ◽  
Microstructural Characterization ◽  
High Entropy Alloy ◽  
High Entropy

Preparation and microstructural characterization of oriented titanosilicate ETS-10 thin films on indium tin oxide surfaces

2010 ◽  
Vol 131 (1-3) ◽  
pp. 401-406 ◽  
Author(s):  
Sezin Galioğlu ◽  
Mariam N. Ismail ◽  
Juliusz Warzywoda ◽  
Albert Sacco ◽  
Burcu Akata
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Microstructural Characterization ◽  
Oxide Surfaces

Optical Thin Films of Metal Oxides Produced by the Sol-Gel Method for Photovoltaic Applications

2019 ◽  
Vol 293 ◽  
pp. 83-95
Author(s):  
Marek Szindler
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Light Transmission ◽  
Sol Gel ◽  
Thin Layers ◽  
Gel Method ◽  
Sol Gel Method ◽  
Wide Range

The use of thin films in optoelectronic and photovoltaic devices is aimed at improving the physical properties of the substrate material. The modification of the surface of the silicon substrate is thus one of the greatest challenges in research on photovoltaic materials, in order to achieve even greater efficiency or better adapt their properties depending on the application. The technologies of applying layers vary depending on the effect to be obtained and the material from which the layer is formed. In practice, the most common method is chemical vapor deposition and physical vapor deposition, and the most commonly applied optical materials are SiO2, TiO2 and Si3N4.This paper presents the results of investigations on morphology and optical properties of the prepared aluminium oxide thin films. Thin films were prepared with use of sol-gel spin coating method. Surface morphology studies were carried out using an atomic force microscope. To characterize the surface of the thin films, 3D images and histograms of the frequency of individual inequalities were made. In order to characterize the optical properties of Al2O3 thin films, the reflectance and light transmission tests were performed using a spectrophotometer. Optical constants were determined using a spectroscopic ellipsometer. Results and their analysis show that the sol-gel method allows the deposition of homogenous thin films of Al2O3 with the desired geometric characteristics and good optical properties. Uniform, continuous thin layers with a roughness not exceeding a few nanometres were deposited. Their deposition enabled to reduce the reflection of light from the polished substrate below 15% in a wide range (425-800nm) while maintaining high transparencies (over 90%). The obtained results causes that mentioned thin films are good potential material for optics, optoelectronics and photovoltaics.

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