scholarly journals Oblique Deposition of Ti/Pt/Au Electrode on Photonic Crystal for Vertical Current Injection

2020 ◽  
Vol 10 (23) ◽  
pp. 8377
Author(s):  
Hanqiao Ye ◽  
Ryota Saeki ◽  
Yifan Xiong ◽  
Takashi Kogure ◽  
Masato Morifuji ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photonic Crystal ◽  
Optical Communications ◽  
Electron Beam Evaporation ◽  
Current Injection ◽  
Current Leakage ◽  
Transmission Line Method ◽  
Oblique Deposition ◽  
Circular Defect ◽  
Evaporation Apparatus

We describe a device for inter-chip or intra-chip optical communications that contains the Circular Defect in photonic crystal (CirD) lasers array driven by vertical current injection. In order to improve the conductivity of the structure while also preventing current leakage, we introduce the oblique deposition of electrodes on a photonic crystal pattern by using an electron beam evaporation apparatus. The performance of an electrode is investigated by a transmission line method, and the CirD structure is fabricated with the electrode. We analyze the voltage-current relationship and confirm the CirD structure’s low resistance of under 1 kΩ.

High Refractive Index Dielectric Prepared by Electron Beam Evaporation for Photonic Crystal Optical Biosensor Application

2010 ◽  
Vol 93-94 ◽  
pp. 545-548
Author(s):  
B. Saekow ◽  
S. Porntheeraphat ◽  
Sakon Rahong ◽  
S. Jaruvanawat ◽  
J. Nukeaw
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Refractive Index ◽  
Electron Beam ◽  
Photonic Crystal ◽  
Optical Measurement ◽  
High Refractive Index ◽  
Electron Beam Evaporation ◽  
Dielectric Thin Film ◽  
Thin Film Layer

The fabricated photonic crystal biosensor device consists of SOG material and titanium dioxide (TiO2) thin films as low and high refractive indexes dielectric layers, respectively. Nano-Imprinting Lithography (NIL) process was used to duplicate periodic line as grating structure from Ni-master mold onto SOG/glass. High refractive index dielectric thin film layer was deposited by using electron beam evaporation system. The surface morphology and thickness of thin film are characterized by atomic force microscope (AFM) and field emission scanning electron microscope (FE-SEM), respectively. The optical measurement system is set up to observed the sensitivity of fabricated device. A shift of reflected peak wavelength observed from DI-water and IPA was tested. The morphology and the thickness of the prepared dielectric thin films are affected to the efficiency of fabricated device.

An investigation of the structure of Nb/Si composite films formed by electron beam evaporation

1985 ◽  
Vol 131 (3-4) ◽  
pp. 261-266 ◽  
Author(s):  
M. Denhoff ◽  
B. Heinrich ◽  
A.E. Curzon ◽  
S. Gygax
Keyword(s):  
Electron Beam ◽  
Composite Films ◽  
Electron Beam Evaporation

Hard and superhard TiAlBN coatings deposited by twin electron-beam evaporation

2007 ◽  
Vol 201 (13) ◽  
pp. 6078-6083 ◽  
Author(s):  
C. Rebholz ◽  
M.A. Monclus ◽  
M.A. Baker ◽  
P.H. Mayrhofer ◽  
P.N. Gibson ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Evaporation

Liquid-phase metal vapor chemistry: rotary reactors and electron-beam evaporation sources

1990 ◽  
Vol 29 (5) ◽  
pp. 1068-1073 ◽  
Author(s):  
G. A. Ozin ◽  
Mark P. Andrews ◽  
C. G. Francis ◽  
H. X. Huber ◽  
K. Molnar
Keyword(s):  
Electron Beam ◽  
Liquid Phase ◽  
Metal Vapor ◽  
Electron Beam Evaporation

AlN thin films fabricated by ultra-high vacuum electron-beam evaporation with ammonia for silicon-on-insulator application

2005 ◽  
Vol 239 (3-4) ◽  
pp. 327-334 ◽  
Author(s):  
Ming Zhu ◽  
Peng Chen ◽  
Ricky K.Y. Fu ◽  
Weili Liu ◽  
Chenglu Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
High Vacuum ◽  
Electron Beam Evaporation ◽  
Silicon On Insulator ◽  
Ultra High Vacuum
Sign in / Sign up

Export Citation Format

Share Document