Growth conditions of benthic diatoms affect quality and quantity of extracellular polymeric larval settlement cues

2005 ◽  
Vol 294 ◽  
pp. 109-116 ◽  
Author(s):  
C Lam ◽  
T Harder ◽  
PY Qian
2018 ◽  
Vol 31 ◽  
pp. 26 ◽  
Author(s):  
Inês Leal ◽  
Élodie Bouchard ◽  
Augusto A.V. Flores ◽  
Réjean Tremblay

Oligotrophic conditions may impose a nutritional challenge for the larval and early post-larval development of bivalves during the search for a suitable benthic habitat. Here we investigated what settlement cues might be important for mytilid populations in southeastern Brazil. Our results point to a trophic trigger mediating larval settlement that may include an effect of saturated fatty acids, probably linked to organic detritus and bacterial production deriving from terrestrial inputs. The prevalence of drifting in this population suggests it may be a strategy for individuals to delay final settlement until encountering favorable trophic environmental conditions.


2014 ◽  
Vol 22 (8) ◽  
pp. 5919-5930 ◽  
Author(s):  
Tânia Vidal ◽  
Catarina Marques ◽  
Nelson Abrantes ◽  
Joana Luísa Pereira ◽  
Amadeu M. V. M. Soares ◽  
...  

Author(s):  
K.M. Hones ◽  
P. Sheldon ◽  
B.G. Yacobi ◽  
A. Mason

There is increasing interest in growing epitaxial GaAs on Si substrates. Such a device structure would allow low-cost substrates to be used for high-efficiency cascade- junction solar cells. However, high-defect densities may result from the large lattice mismatch (∼4%) between the GaAs epilayer and the silicon substrate. These defects can act as nonradiative recombination centers that can degrade the optical and electrical properties of the epitaxially grown GaAs. For this reason, it is important to optimize epilayer growth conditions in order to minimize resulting dislocation densities. The purpose of this paper is to provide an indication of the quality of the epitaxially grown GaAs layers by using transmission electron microscopy (TEM) to examine dislocation type and density as a function of various growth conditions. In this study an intermediate Ge layer was used to avoid nucleation difficulties observed for GaAs growth directly on Si substrates. GaAs/Ge epilayers were grown by molecular beam epitaxy (MBE) on Si substrates in a manner similar to that described previously.


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