Preparation of thin film memories by thermal evaporation

Shinku ◽  
1961 ◽  
Vol 4 (11) ◽  
pp. 474-482
Author(s):  
Hiroshi ISHII ◽  
Akio ITO
2015 ◽  
Vol 11 (2) ◽  
pp. 3017-3022
Author(s):  
Gurban Akhmedov

Results of researches show, that film p-n the structures received by a method of discrete thermal evaporation in a uniform work cycle, are suitable for use in low-voltage devices.  As a result of work are received p-n heterojunctions in thin-film execution, described by high values of differential resistance. Show that, thermo endurance - T0 maybe using as characteristic of thermo endurance of optic materials. If heating flow, destruction temperature and internal surface temperature is measured during test, it is possible to determine value T0 and other necessity characteristics. As a result of the taking test was lead to comparison evaluation of considered materials. Working range of heating flow and up level heating embark have been determined.


2021 ◽  
pp. 129657
Author(s):  
J.D. Gamez ◽  
H. Martínez-Sánchez ◽  
J.L. Valenzuela ◽  
L. Marín ◽  
L.A. Rodríguez ◽  
...  

Author(s):  
Arrigo Calzolari ◽  
Andrzej Rajca ◽  
Maria Benedetta Casu

We demonstrate the possibility to evaporate Blatter radical derivatives in a controlled environment obtaining thin films that preserve the (poly)radical magnetic character. However, their thermal evaporation is challenging. We analyse...


2020 ◽  
Vol 21 (1) ◽  
pp. 8
Author(s):  
Emy Mulyani ◽  
Tjipto Sujitno ◽  
Dessy Purbandari ◽  
Ferdiansjah Ferdiansjah ◽  
Sayono Sayono

This paper presents the research on the growth of ZnS:Ag:Cu thin film on a glass substrate as a radio-luminescent material. The SRIM/TRIM software is used to determine the optimum thickness based on an energy deposition depth of 5.485 MeV Am 241 alpha radiation source on ZnS:Ag:Cu material. To increase the adhesive strength of the coating, initially, the glass substrate is etched using a plasma glow discharged at 280°C for 15 minutes. Multiple coatings of ZnS:Ag:Cu were  etched on the glass substrate; this was carried out using a thermal evaporation technique to achieve the optimal thickness (based on SRIM/TRIM simulation). The thin film thickness was observed using a scanning electron microscope (SEM). The optical properties of the un-etched, etched glass substrate and thin-film were characterized using UV-Vis spectrometer. Based on SRIM/TRIM simulation, the optimal thickness is 22 mm which can be achieved by coating three times. From optical properties of ZnS:Ag:Cu thin film and after being analysed using Taue plot method, it is found that the energy gap of ZnS:Ag:Cu thin film is 2.48 eV. It can be concluded that the addition of Ag and Cu doped decrease the energy gap of ZnS (3.66 eV).


Vacuum ◽  
2020 ◽  
Vol 176 ◽  
pp. 109167
Author(s):  
Sina Rouhi ◽  
Jose Enrique Martinez-Medina ◽  
Mehtap Ozdemir ◽  
Mehmet Ertugrul ◽  
Gulnur Aygun ◽  
...  

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