scholarly journals A Planar Magnetron Sputtering Cathode with Film Thickness Distribution Controllability

Shinku ◽  
1982 ◽  
Vol 25 (4) ◽  
pp. 217-220
Author(s):  
Katsuo ABE ◽  
Shigeru KOBAYASHI ◽  
Tsuneaki KAMEI
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Thickness Distribution ◽  
Planar Magnetron

scholarly journals Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 599
Author(s):  
Handan Huang ◽  
Li Jiang ◽  
Yiyun Yao ◽  
Zhong Zhang ◽  
Zhanshan Wang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Multilayer Film ◽  
Thickness Distribution ◽  
Parabolic Cylinder ◽  
Particle Model ◽  
Planetary Motion ◽  
X Rays ◽  
X Ray ◽  
Sputtering System

The laterally graded multilayer collimator is a vital part of a high-precision diffractometer. It is applied as condensing reflectors to convert divergent X-rays from laboratory X-ray sources into a parallel beam. The thickness of the multilayer film varies with the angle of incidence to guarantee every position on the mirror satisfies the Bragg reflection. In principle, the accuracy of the parameters of the sputtering conditions is essential for achieving a reliable result. In this paper, we proposed a precise method for the fabrication of the laterally graded multilayer based on a planetary motion magnetron sputtering system for film thickness control. This method uses the fast and slow particle model to obtain the particle transport process, and then combines it with the planetary motion magnetron sputtering system to establish the film thickness distribution model. Moreover, the parameters of the sputtering conditions in the model are derived from experimental inversion to improve accuracy. The revolution and rotation of the substrate holder during the final deposition process are achieved by the speed curve calculated according to the model. Measurement results from the X-ray reflection test (XRR) show that the thickness error of the laterally graded multilayer film, coated on a parabolic cylinder Si substrate, is less than 1%, demonstrating the effectiveness of the optimized method for obtaining accurate film thickness distribution.

Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering

2017 ◽  
Vol 35 (6) ◽  
pp. 061301 ◽  
Author(s):  
Ivan A. Starkov ◽  
Ilya A. Nyapshaev ◽  
Alexander S. Starkov ◽  
Sergey N. Abolmasov ◽  
Alexey S. Abramov ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Thickness Distribution ◽  
Ito Film ◽  
Influence Of Substrate

Simulation and Experimental of Magnetron Sputtering Film Thickness Distribution

2011 ◽  
Vol 399-401 ◽  
pp. 1741-1745
Author(s):  
Jin Xin Wang ◽  
Ya Ping Han ◽  
Xue Lian Gao ◽  
Ming Hai Luo ◽  
Shao Ze Wang
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Physical Model ◽  
Theoretical Basis ◽  
Thickness Distribution

A physical model of magnetron sputtering process was built, the distribution of film thickness on the substrate was deduced, and the data were analysised by using the Mathematica and Matlab. The results show that the distribution of the film thickness on the substrate is uneven and it is also influenced by the radius as well as the distance between the target and substrate. The results of experiment correspond fairly well with the theory. The relational expression provides a theoretical basis for evaluation and estimation of the film thickness.

Theoretical and Experimental Analysis on Magnetron Sputtering Film Thickness Distribution

2012 ◽  
Vol 450-451 ◽  
pp. 334-337 ◽  
Author(s):  
Ya Ping Han ◽  
Shao Ze Wang ◽  
Qing Wen Wang ◽  
Jin Xin Wang ◽  
Ming Hai Luo
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Experimental Analysis ◽  
Thickness Distribution

Experimental and Simulation Study of Magnetron Sputtering MgO Film Thickness Distribution

2014 ◽  
Vol 900 ◽  
pp. 401-404 ◽  
Author(s):  
Ya Ping Han ◽  
Jing Yan Feng ◽  
Qiang Fu ◽  
Fan Da Zeng ◽  
Guan Wang
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Physical Model ◽  
Simulation Study ◽  
Theoretical Basis ◽  
Thickness Distribution ◽  
Si Substrate

A physical model of magnetron sputtering process was built, the distribution of MgO film thickness on the substrate was deduced, and the data were analyzed by using the Matlab. nanosized MgO thin film was prepared on Si substrate by magnetron sputtering. SGC-10 was used to measure the thickness of MgO thin film. The results of experiment correspond fairly well with the theory. Both experiment and the theory show that the distribution of the film thickness on the substrate is uneven and it is also influenced by the radius as well as the distance between the target and substrate. The physical model provides a theoretical basis for evaluation and estimation of the film thickness.

scholarly journals Research of Film Uniformity on Vacuum Coating by Magnetron Sputtering with Multi-Sites

2011 ◽  
Vol 2-3 ◽  
pp. 1082-1087 ◽  
Author(s):  
Ying Huang ◽  
Shi Tie Gao ◽  
Meng Liu
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Thickness Distribution ◽  
Velocity Ratio ◽  
Axial Rotation ◽  
Thickness Uniformity ◽  
Substrate Distance ◽  
Film Distribution ◽  
Study Results ◽  
Sputtering System

A new type of multi-site magnetron sputtering system has been researched, which has more than one workbench. Based on the operating principle of the magnetron sputtering system which with a circular plane target, a mathematical model has been developed to simulate and discuss the influencing factors on the film thickness uniformity. The results showed that when the substrates were rotating axially and eccentrically, the film thickness distribution were affected by both the target-substrate distance and the eccentricity. If the eccentricity was constant, the film thickness would become thinner when the target-substrate distance increased, and the thickness uniformity tended to be improved. If the target-substrate distance was constant, the thickness uniformity would become better when the eccentricity increased. Moreover, if the substrate rotated axially and revolved around the target simultaneously, the thickness uniformity would become better when velocity ratio of axial rotation to revolution increased. And the effect of the thickness uniformity became small gradually if the ratio increases to a certain degree. In addition, increasing the etching area properly not only could conduct the film distribution to better, and improve the substrate film thickness uniformity also. Finally, taking a series of experiments, and analyzing the experimental data, the conclusion of the study results in the paper had been verified.

scholarly journals The Increase in Thickness Uniformity of Films Obtained by Magnetron Sputtering with Rotating Substrate

2016 ◽  
Vol 3 (3) ◽  
pp. 100-104 ◽  
Author(s):  
D. Golosov ◽  
S. Melnikov ◽  
S. Zavadski ◽  
V. Kolos ◽  
J. Okojie
Keyword(s):  
Experimental Data ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Thickness Distribution ◽  
Model Error ◽  
Film Deposition ◽  
Substrate Rotation ◽  
Titanium Thin Films ◽  
Simulation Results

The titanium thin films obtained by magnetron sputtering with the rotating substrate at different distances between the substrate and magnetron centers were studied with regard to the uniformity of the film thickness distribution. On the basis of the experimental data obtained, the model for the magnetron film deposition during substrate rotation was developed. The analysis of the simulation results shows that the model error is not greater than 10%.

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