Background Gas Pressure Effects in the Cylindrical Hall Thruster

2010 ◽  
Author(s):  
Yevgeny Raitses ◽  
Jeffrey Parker ◽  
Evan Davis ◽  
Nathaniel Fisch
Keyword(s):  
Gas Pressure ◽  
Pressure Effects ◽  
Hall Thruster ◽  
Background Gas

scholarly journals Background Pressure Effects on the Performance of a 20 kW Magnetically Shielded Hall Thruster Operating in Various Configurations

Aerospace ◽  
2021 ◽  
Vol 8 (3) ◽  
pp. 69
Author(s):  
Antonio Piragino ◽  
Farbod Faraji ◽  
Maryam Reza ◽  
Eugenio Ferrato ◽  
Annalisa Piraino ◽  
...  
Keyword(s):  
Mass Flow ◽  
Discharge Current ◽  
Pressure Effects ◽  
Hall Thruster ◽  
Physical Processes ◽  
Linear Behavior ◽  
Mass Flow Rates ◽  
Anode Mass ◽  
Lower Background ◽  
Operating Regimes

The paper reports the characterization results of a 20 kW-class magnetically shielded Hall thruster in three different configurations and operating with a centrally mounted cathode. The characterization was carried out at two different pumping speeds in SITAEL’s IV10 vacuum chamber, resulting in two different background pressure levels for each tested operating point. A linear behavior of discharge current and thrust values versus the anode mass flow rate was noticed for both pumping speeds levels and for all the three configurations. In addition, the thrust and discharge current values were always found to be lower at lower background pressure levels. From the performance levels, a preliminary estimate of the ingested mass flow rates was performed, and the values were then compared to a recently developed background flow model. The results suggested that, for this thruster and in the tested operating regimes, the change in performance due to background pressure could be ascribed not only to the ingestion of external mass flow coming from the chamber but also to other physical processes caused by the flux of residual background neutrals.

Effect of Non-equilibrium Pulsed Ejection of Si Species into Background Gas on the Formation of Si Nanocrystallite and Nanocrystal-film

2011 ◽  
Vol 1305 ◽  
Author(s):  
Ikurou Umezu ◽  
Shunto Okubo ◽  
Akira Sugimura
Keyword(s):  
Laser Ablation ◽  
Film Growth ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Hydrogen Gas ◽  
Gas Pressure ◽  
Spatial Confinement ◽  
The Individual ◽  
Background Gas ◽  
Non Equilibrium

ABSTRACTThe Si nanocrystal-films are prepared by pulsed laser ablation of Si target in a mixture of helium and hydrogen gas. The total gas pressure and hydrogen partial gas pressure were varied to control structure of nanocrystal-film. The surface of Si nanocrystallite was hydrogenated and degree of hydrogenation increased with increasing hydrogen partial gas pressure. The aggregate structure of nanocrystal-film depended on both the total gas pressure and the hydrogen partial gas pressure. The former and the latter alter spatial confinement of Si species during deposition and the surface hydrogenation of individual nanocrystal, respectively. Spatial confinement increases probability of collision between nanocrystals in the plume. While, surface hydrogenation prevents coalescence of nanocrystals. The individual or aggregated nanocrystals formed in the plume reach the substrate and the nanocrystal-film is deposited on the substrate. The non-equilibrium growth processes during pulsed laser ablation are essential for the formation of the surface structure and the subsequent nanocrystal-film growth. Our results indicate that the structure of nanocrystal-film depends on the probabilities of collision and coalescence between nanocrystals in the plume. These probabilities can be varied by controlling the total gas pressure and the hydrogen partial gas pressure.

Modelling gas pressure effects on explosive rock breakage

1988 ◽  
Vol 6 (1) ◽  
pp. 73-79 ◽  
Author(s):  
Rahim Haghighi ◽  
Robert R. Britton ◽  
Duane Skidmore
Keyword(s):  
Gas Pressure ◽  
Pressure Effects ◽  
Rock Breakage

High gas pressure effects on yeast

2008 ◽  
Vol 101 (4) ◽  
pp. 729-738 ◽  
Author(s):  
V. Espinasse ◽  
J.-M. Perrier-Cornet ◽  
A. Marecat ◽  
P. Gervais
Keyword(s):  
Gas Pressure ◽  
Pressure Effects

Non-equilibrium Growth Processes of Porous TiO2 Nanocrystal-films during Pulsed Laser Ablation

2013 ◽  
Vol 1497 ◽  
Author(s):  
Ikurou Umezu ◽  
Nobuyasu Yagi ◽  
Akira Sugimura ◽  
Takehito Yoshida
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Hierarchical Structures ◽  
Pulsed Laser Ablation ◽  
Rutile Phase ◽  
Gas Pressure ◽  
Target Distance ◽  
Structural Formation ◽  
Background Gas ◽  
Non Equilibrium

ABSTRACTWe performed pulsed laser ablation of titanium dioxide (TiO2) target in O2 background gas. Effects of background gas pressure and substrate target distance on the structure of deposited films are clarified. The hierarchical structures are observed when we change scale of observation. The film deposited on the substrate is composed of primary nanocrystal and secondary porous-aggregated-nanostructures. The primary nanocrystal changes from anatase to rutile phase with increasing background gas pressure or substrate target distance. The porosity of secondary aggregated structure increases with increasing background gas pressure or substrate target distance. The similarity between the effects of background gas and substrate target distance indicates that confinement of the plume between target and substrate is important for structural formation. The non-equilibrium aggregation processes of nanocrystals in the plume and on the substrate are essential for the hierarchical structure of the nanocrystal film.

Pressure Effects on the Lifetime of Gas High Density Polyethylene Pipes

2021 ◽  
Author(s):  
Yang Wang ◽  
Hui-qing Lan ◽  
Tao Meng ◽  
Bing Wang ◽  
Du du Guo ◽  
...  
Keyword(s):  
Natural Gas ◽  
Induction Time ◽  
High Density Polyethylene ◽  
Reaction Rate ◽  
Low Pressure ◽  
Gas Pressure ◽  
High Density ◽  
Pressure Effects ◽  
Polyethylene Pipes ◽  
Hdpe Pipes

Abstract The purpose of this study was to propose low gas pressure effects on lifetime of natural gas high density polyethylene (HDPE) pipes by thermal-oxidative aging (TOA). The new method to assess the lifetime of HDPE natural gas pipes is based on gas pressure testing. An approach to monitor oxidative induction time (OIT) has been used to predict lifetime. Natural gas HDPE pipes were used to evaluate the effects of low gas pres-sures on oxidative induction time. In order to emphasize the pressure effects, relatively low temperatures at 45, 55, 65 and 75 °C were utilized for the exposure. The low-pressure conditions were created using air at levels of 0, 0.1, 0.2, 0.3 and 0.4 MPa. The property of high density polyethylene pipes was effectively moni-tored using the low pressure oxidative induction time (OIT) test. The results show that the aging reaction rate of high density polyethylene pipes increased exponentially with temperature and gas pressure according to the Arrhenius equation. Analytical models were developed to predict the aging reaction rate and lifetime of natural gas HDPE pipes.

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