scholarly journals Measurements and predictions of turbulence generation in homogeneous particle-laden flows

2000 ◽  
Author(s):  
J.-H. Chen ◽  
G. Faeth
AIAA Journal ◽  
2000 ◽  
Vol 38 ◽  
pp. 636-642
Author(s):  
J.-H. Chen ◽  
J.-S. Wu ◽  
G. M. Faeth

AIAA Journal ◽  
2000 ◽  
Vol 38 (4) ◽  
pp. 636-642 ◽  
Author(s):  
J.-H. Chen ◽  
J.-S. Wu ◽  
G. M. Faeth

Author(s):  
Keinosuke Kobayashi

Equidensitometry as developed by E. Lau and W. Krug has been little used in the analysis of ordinary electron photomicrographs, yet its application to the high voltage electron images proves merits of this procedure. Proper sets (families) of equidensities as shown in the next page are able to reveal the contour map of mass thickness distribution in thick noncrystalline specimens. The change in density of the electron micrograph is directly related to the mass thickness of corresponding area in the specimen, because of the linear response of photographic emulsions to electrons and the logarithmic relation between electron opacity and mass thickness of amorphous object.This linearity is verified by equidensitometry of a spherical solid object as shown in Fig. 1a. The object is a large (1 μ) homogeneous particle of polystyrene. Fig. 1b is a composite print of three equidensities of the 1st order prepared from Fig. 1a.


Author(s):  
Marylyn Bennett-Lilley ◽  
Thomas T.H. Fu ◽  
David D. Yin ◽  
R. Allen Bowling

Chemical Vapor Deposition (CVD) tungsten metallization is used to increase VLSI device performance due to its low resistivity, and improved reliability over other metallization schemes. Because of its conformal nature as a blanket film, CVD-W has been adapted to multiple levels of metal which increases circuit density. It has been used to fabricate 16 MBIT DRAM technology in a manufacturing environment, and is the metallization for 64 MBIT DRAM technology currently under development. In this work, we investigate some sources of contamination. One possible source of contamination is impurities in the feed tungsten hexafluoride (WF6) gas. Another is particle generation from the various reactor components. Another generation source is homogeneous particle generation of particles from the WF6 gas itself. The purpose of this work is to investigate and analyze CVD-W process-generated particles, and establish a particle characterization methodology.


2021 ◽  
Author(s):  
Gabriel B. Goodwin ◽  
Christian L. Bachman ◽  
Ryan F. Johnson ◽  
David A. Kessler

Particles ◽  
2018 ◽  
Vol 1 (1) ◽  
pp. 7 ◽  
Author(s):  
Ernazar Abdikamalov ◽  
César Huete ◽  
Ayan Nussupbekov ◽  
Shapagat Berdibek

Author(s):  
Ryuichi Iwata ◽  
Takeo Kajishima ◽  
Shintaro Takeuchi

In the present study, bubble-particle interactions in suspensions are investigated by a coupled immersed-boundary and volume-of-fluid method (IB-VOF method), which is proposed by the present authors. The validity of the numerical method is examined through simulations of a rising bubble in a liquid and a falling particle in a liquid. Dilute particle-laden flows and a gas-liquid-solid flow involving solid particles and bubbles of comparable sizes to one another (Db/Dp = 1) are simulated. Drag coefficients of particles in particle-laden flows are estimated and flow fields involving multiple particles and a bubble are demonstrated.


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