scholarly journals Journal of Chemical Metrology

10.25135/jcm ◽  
2020 ◽  
Keyword(s):  
Chemical Metrology

Roles of chemical metrology in electronics industry and associated environment in Korea: A tutorial

Talanta ◽  
2015 ◽  
Vol 134 ◽  
pp. 284-291 ◽  
Author(s):  
Namgoo Kang ◽  
Kyung Joong Kim ◽  
Jin Seog Kim ◽  
Joung Hae Lee
Keyword(s):  
Electronics Industry ◽  
Chemical Metrology

The potential of TXRF as a primary method in chemical metrology

1998 ◽  
Vol 3 (11) ◽  
pp. 470-472 ◽  
Author(s):  
B. Neidhart ◽  
J. Knoth ◽  
H. Schwenke
Keyword(s):  
Primary Method ◽  
Chemical Metrology

scholarly journals Highly spatial-resolved chemical metrology on latent resist images

2022 ◽  
Author(s):  
Maarten van Es ◽  
Mehmet Tamer ◽  
Robbert Bloem ◽  
Laurent Fillinger ◽  
Elfi van Zeijl ◽  
...  
Keyword(s):  
Semiconductor Manufacturing ◽  
Electron Beams ◽  
Experimental Proof ◽  
Crucial Step ◽  
Chemical Metrology ◽  
Force Microscopy ◽  
Atomic Force ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Infra Red

Abstract Patterning photoresist with extreme control over dose and placement is the first crucial step in semiconductor manufacturing. But, how to accurately measure the activation of modern complex resists components at sufficient spatial resolution? No exposed nanometre-scale resist pattern is sufficiently sturdy to unaltered withstand inspection by intense photon or electron beams, not even after processing and development. This paper presents experimental proof that Infra-Red Atomic Force Microscopy (IR-AFM) is sufficiently sensitive and gentle to chemically record the vulnerable-yet-valuable lithographic patterns in a chemically amplified resist after exposure, prior to development. Accordingly, IR-AFM metrology provides the long-sought-for insights in changes in the chemical and spatial distribution per component in a latent resist image, both directly after exposure as well as during processing. With these to-be-gained understandings, a disruptive acceleration of resist design and processing is expected.

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