scholarly journals Decomposition and detoxification of DXNs adsorbed on various solid wastes by microwave plasma treatment

2006 ◽  
Author(s):  
R. Sasai ◽  
M. Jin-no ◽  
A. Satoh ◽  
Y. Imai ◽  
H. Itoh
Keyword(s):  
Plasma Treatment ◽  
Microwave Plasma ◽  
Solid Wastes

THE MODIFICATION OF PAPER INDUCED BY RADIO FREQUENCY AND MICROWAVE PLASMA TREATMENT

2007 ◽  
Vol 11 (4) ◽  
pp. 593-600
Author(s):  
V. V. Azharonok ◽  
I. I. Filatova ◽  
A. P. Dostanko ◽  
S. V. Bordusov ◽  
Yu. S. Shynkevich
Keyword(s):  
Radio Frequency ◽  
Plasma Treatment ◽  
Microwave Plasma

X-Ray Photoelectron-Spectroscopic Studies of Carbon Fiber Surfaces. Part IX: The Effect of Microwave Plasma Treatment on Carbon Fiber Surfaces

1989 ◽  
Vol 43 (7) ◽  
pp. 1153-1158 ◽  
Author(s):  
Yaoming Xie ◽  
Peter M. A. Sherwood
Keyword(s):  
Carbon Fiber ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Prolonged Exposure ◽  
Microwave Plasma ◽  
Spectroscopic Studies ◽  
X Ray ◽  
Fiber Damage ◽  
Surface Functionality ◽  
Fiber Treatment

X-ray photoelectron spectroscopy has been used to monitor the surface chemical changes occurring on type II carbon fibers exposed to air, oxygen, and nitrogen plasmas. In all cases the plasmas caused changes in surface functionality, in terms of both C-O and C-N functionality. Prolonged exposure to the plasmas caused loss of surface functionality for air and oxygen plasmas, and extended treatment caused fiber damage. Plasma treatment of fibers promises to be an effective method of fiber treatment.

Microwave plasma treatment of polymer surface for irreversible sealing of microfluidic devices

Lab on a Chip ◽  
2005 ◽  
Vol 5 (10) ◽  
pp. 1173 ◽  
Author(s):  
Alex Y. N. Hui ◽  
Gang Wang ◽  
Bingcheng Lin ◽  
Wing-Tat Chan
Keyword(s):  
Plasma Treatment ◽  
Microwave Plasma ◽  
Polymer Surface ◽  
Microfluidic Devices

Green" technologies in plasma treatment of solid wastes

2021 ◽  
pp. 2-7
Author(s):  
A. V. ARTEMOV ◽  
A. V. PERESLAVTSEV ◽  
S. A. VOSHCHININ ◽  
S. S. TRESVYATSKY ◽  
S. V. KOROBTSEV
Keyword(s):  
Plasma Treatment ◽  
Solid Wastes ◽  
Green Technologies

Studies on Microwave-Plasma Treatment of Froth Flotation Tailings

2020 ◽  
Vol 299 ◽  
pp. 1044-1051
Author(s):  
Almaz Kozhonov ◽  
Anvar Samsaliev ◽  
Yulia I. Toporkova
Keyword(s):  
Plasma Treatment ◽  
Microwave Plasma ◽  
Raw Materials ◽  
Froth Flotation ◽  
Molybdenum Sulfide ◽  
Gold Content ◽  
Efficient Technology ◽  
Plasma Exposure ◽  
Gold Extraction

An efficient technology is currently being searched for the processing of aged enrichment gold-containing tailings at the «Solton-Sary» enrichment plant, Kyrgyzstan. In this paper, the effect of microwave-plasma exposure on aged tailings and further gold extraction using froth flotation were investigated. Microwave-plasma treatment of the material was carried out in the presence of the following materials: charcoal, coal/quartz and molybdenum sulfide. Microwave-plasma treatment allowed to improve the quality of flotation concentrates in terms of the gold content from 130 ppm to 227 ppm. The design of plasmatron and methodology of plasma treatment were proposed. The results shown in this paper are valuable for mining organization in terms of searching for new industrial waste processing approaches and for broadening their raw materials base.

Amination of diamond film by ammonia microwave plasma treatment

2015 ◽  
Vol 54 ◽  
pp. 34-38 ◽  
Author(s):  
J.J. Wei ◽  
J.L. Liu ◽  
L.X. Chen ◽  
L.F. Hei ◽  
F.X. Lv ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Diamond Film ◽  
Microwave Plasma

Cuprous Oxide Films Prepared by Using a Microwave Atmospheric Pressure Plasma Torch

2008 ◽  
Vol 47-50 ◽  
pp. 1015-1018 ◽  
Author(s):  
Hong Ying Chen ◽  
Lien Teng Kuo ◽  
Wan Yu Chang ◽  
Cheng Hsien Tsai
Keyword(s):  
Plasma Treatment ◽  
Cuprous Oxide ◽  
Atmospheric Pressure ◽  
Plasma Torch ◽  
Microwave Plasma ◽  
Cupric Oxide ◽  
Oxide Films ◽  
Atmospheric Pressure Plasma ◽  
Oxide Phase ◽  
Nitrogen Plasma

A 2.45 GHz microwave atmospheric pressure torch is employed to prepare cuprous oxide films. The sputtered copper films are firstly deposited on slide glass. After that, the films are annealed in air at 500°C for 12 h, which would directly oxidize into cupric oxide. The annealed films are then treated by atmospheric nitrogen plasma at 800 W for 10 min. The color changed significantly from black to reddish brown after nitrogen plasma treatment. The X-ray diffraction patterns show that annealed films are cupric oxide which is vanished after plasma treatment. The cuprous oxide films appeared after nitrogen plasma treatment. The resistivity of annealed films is 16.7 --cm, which reduce to 2.08 --cm after plasma treatment. The optical band gap of annealed films, cupric oxide phase, is 2.1 eV but the value shifts toward 2.4 eV after plasma treatment. The novel microwave plasma torch posses a fast and easy way to fabricate cuprous oxide films.

Enhanced Wettability of Nanocrystalline Diamond Films for Biocoating Applications

2012 ◽  
Vol 1395 ◽  
Author(s):  
Jason H. C. Yang ◽  
Kungen Teii
Keyword(s):  
Contact Angle ◽  
Plasma Treatment ◽  
Oxygen Plasma ◽  
Microwave Plasma ◽  
Hydrogen Plasma ◽  
Film Surface ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Polar Component ◽  
Oxygen Plasma Treatment

ABSTRACTNanocrystalline diamond (NCD) films are prepared from Ar-rich/N2/CH4 and Ar-rich/H2/CH4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately to enhance the wetting property. The hydrogen plasma treatment has small effect on the surface roughness, while the oxygen plasma treatment forms fine protrusions on the film surface. Results show that the wettability of the hydrogen plasma treated NCD film is nearly constant or little improvement as the polar component of the apparent surface free energy is close to the as-deposit NCD film. In contrast, the wettability of the oxygen plasma treated NCD film is improved dramatically such that the contact angle is reduced from 92º and 4.7º to almost 0º for water and 1-bromonaphthalene, respectively, and the polar component increases significantly to 34 mJ/m2. The low contact angle suggests that the film is considerably a cell adhesive friendly surface, which is essential in maintaining multicellular structure, and thus making it a favorable wetting surface for biological and biomedical applications.

Hydrogen microwave plasma treatment of Si and SiO2

2016 ◽  
Vol 304 ◽  
pp. 359-363 ◽  
Author(s):  
Stephan Altmannshofer ◽  
Ignaz Eisele ◽  
Alexander Gschwandtner
Keyword(s):  
Plasma Treatment ◽  
Microwave Plasma
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