Analysis of Oxidized Film Formation and Evaluation of Intrinsic Stress in the a-Si Layer of Semiconductor Microscopic Patterned Structures Using Molecular Dynamics Method
2016 ◽
Vol 65
(2)
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pp. 127-134
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2000 ◽
Vol 20
(1Supplement)
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pp. 43-46
2016 ◽
Vol 13
(1)
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pp. 3-20
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1985 ◽
Vol 6
(3)
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pp. 148-153
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2015 ◽
Vol 119
(46)
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pp. 14594-14603
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