scholarly journals Jounng o Titanium Using Ag-Cu Alloy Thin Film Deposited on Bonding Surface with Ion Beam Sputtering.

2000 ◽  
Vol 49 (7) ◽  
pp. 767-773
Author(s):  
Akio HIROSE ◽  
Makoto NOJIRI ◽  
Hirotake ITO ◽  
Kojiro F. KOBAYASHI
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Alloy Thin Film ◽  
Ion Beam Sputtering ◽  
Cu Alloy ◽  
Beam Sputtering ◽  
Bonding Surface

S043031 Mechanical and Wear Properties of Ti-Ni Alloy Thin Film Formed by Ion Beam Sputtering Method

2011 ◽  
Vol 2011 (0) ◽  
pp. _S043031-1-_S043031-4
Author(s):  
Hitoo TOKUNAGA ◽  
Keisuke MATSUMOTO ◽  
Minoru GOTO ◽  
Takayuki TOKOROYAMA ◽  
Noritsugu UMEHARA
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Alloy Thin Film ◽  
Ion Beam Sputtering ◽  
Wear Properties ◽  
Ni Alloy ◽  
Beam Sputtering

scholarly journals 909 Ti-Ni shape memory alloy thin film formed by Ion beam sputtering

2010 ◽  
Vol 2010 (0) ◽  
pp. 529-530
Author(s):  
Hitoo TOKUNAGA ◽  
Keisuke MATSUMOTO ◽  
Minoru GOTO ◽  
Takayuki TOKOROYAMA ◽  
Noritsugu UMEHARA
Keyword(s):  
Thin Film ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
Ion Beam ◽  
Alloy Thin Film ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

2019 ◽  
Vol 682 ◽  
pp. 109-120 ◽  
Author(s):  
Wjatscheslaw Sakiew ◽  
Stefan Schrameyer ◽  
Marco Jupé ◽  
Philippe Schwerdtner ◽  
Nick Erhart ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Ion Beam ◽  
Two Dimensional ◽  
Ion Beam Sputtering ◽  
Thin Film Thickness ◽  
Optical Thin Film ◽  
Beam Sputtering ◽  
Beam Parameters

Characteristics of optical band gap of tantalum oxide thin film deposited by ion beam sputtering

2017 ◽  
Vol 25 (1) ◽  
pp. 21-27
Author(s):  
刘华松 LIU Hua-song ◽  
杨 霄 YANG Xiao ◽  
王利栓 WANG Li-shuan ◽  
姜玉刚 JIANG Yu-gang ◽  
季一勤 JI Yi-qin ◽  
...  
Keyword(s):  
Thin Film ◽  
Band Gap ◽  
Optical Band Gap ◽  
Ion Beam ◽  
Tantalum Oxide ◽  
Oxide Thin Film ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Ln-Ba-Cu-O Thin Film Deposited by Ion Beam Sputtering

1989 ◽  
pp. 527-531
Author(s):  
Tsutomu Yotsuya ◽  
Yoshihiko Suzuki ◽  
Soichi Ogawa ◽  
Hajime Kuwahara ◽  
Tetsuro Tajima ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

The effect of charged particles when preparing ZnO thin film by ion beam sputtering deposition

1988 ◽  
Vol 33-34 ◽  
pp. 1114-1119 ◽  
Author(s):  
Yoshihiko Suzuki ◽  
Tsutom Yotsuya ◽  
Katsumi Takiguchi ◽  
Masaaki Yoshitake ◽  
Soichi Ogawa
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Charged Particles ◽  
Zno Thin Film ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering

Controlled thin-film deposition of α or β Ga2O3 by ion-beam sputtering

2020 ◽  
Vol 38 (6) ◽  
pp. 063412
Author(s):  
Martin Becker ◽  
Sebastian L. Benz ◽  
Limei Chen ◽  
Angelika Polity ◽  
Peter J. Klar ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Preparation of giant magnetostrictive thin film by magnetron and ion beam sputtering processes

2000 ◽  
Vol 71 (2) ◽  
pp. 996-998 ◽  
Author(s):  
K. Nakazato ◽  
M. Hashimoto ◽  
H. Uchida ◽  
Y. Matsumura
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering
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