Study of process window development for high deposition-rate laser material deposition by using mixed processing parameters

2015 ◽  
Vol 27 (3) ◽  
pp. 032008 ◽  
Author(s):  
Chongliang Zhong ◽  
Andres Gasser ◽  
Jochen Kittel ◽  
Thomas Schopphoven ◽  
Norbert Pirch ◽  
...  
2015 ◽  
Vol 75 ◽  
pp. 87-92 ◽  
Author(s):  
Chongliang Zhong ◽  
Andres Gasser ◽  
Thomas Schopphoven ◽  
Reinhart Poprawe

2021 ◽  
Author(s):  
Rebar Hama-Saleh ◽  
Kerim Yildirim ◽  
Susanne Hemes ◽  
Andreas Weisheit ◽  
Constantin Leon Häfner

Ti-6Al-4V is the most prominent titanium alloy widely used e.g. for aerospace applications. Conventionally, many Ti-6Al-4V aerospace components are produced by a multi-stage hot forging process followed by subsequent machining which often generates a high amount of scrap. Additive manufacturing (AM), such as powder-based laser material deposition (p-LMD), enables parts to be made with geometric freedom and near-net-shape, but so far lacks high deposition rates. The present study proposes high-deposition-rate laser material deposition manufacturing using a large laser beam diameter and increased scanning speed to achieve deposition rates up to 5 kg/h. As Ti-6Al-4V is prone to oxygen pick-up, the process was performed in an inert atmosphere. We determined suitable process windows for tracks without fusion defects and low porosity and investigated microstructure and hardness.


2006 ◽  
Vol 979 ◽  
Author(s):  
Andreas Kulovits ◽  
John Leonard ◽  
Jorg Wiezorek

AbstractIt has long been recognized that thin film polycrystalline microstructures are determined by the thermodynamics and kinetics associated with physical vapor deposition, but it is quite process dependent and not easily quantified. We have examined the microstructure in polycrystalline Au films obtained by pulse laser deposition (PLD) under various conditions and interpret the results in terms of three fundamental parameters common to all physical vapor deposition: Flux kinetic energy, substrate temperature, and deposition rate. With this model, it is predicted that nanocrystalline films are formed in the limits of low temperature, flux, and high deposition rate. The deposited films are analyzed with X-ray diffraction and SEM to determine texture and grain morphology, which are found to fit well within the process maps.


2021 ◽  
Vol 33 (1) ◽  
pp. 012019
Author(s):  
Jonathan Schaible ◽  
Luis Andrea Hau ◽  
David Weber ◽  
Thomas Schopphoven ◽  
Constantin Häfner ◽  
...  

2021 ◽  
Vol 48 (6) ◽  
pp. 0602112
Author(s):  
庞祎帆 Pang Yifan ◽  
傅戈雁 Fu Geyan ◽  
王明雨 Wang Mingyu ◽  
龚燕琪 Gong Yanqi ◽  
余司琪 Yu Siqi ◽  
...  

1977 ◽  
Vol 13 (20) ◽  
pp. 608 ◽  
Author(s):  
K. Yoshida ◽  
Y. Furui ◽  
S. Sentsui ◽  
T. Kuroha

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