scholarly journals Nanocrystalline Porous Thin Film VNx Hydrogen Absorbents: Method of Production, Structure and Properties

Author(s):  
Alexey Guglya ◽  
◽  
Alexander Kalchenko ◽  
Elena Solopikhina ◽  
Viktor Vlasov ◽  
...  
Author(s):  
C.K. Wu ◽  
P. Chang ◽  
N. Godinho

Recently, the use of refractory metal silicides as low resistivity, high temperature and high oxidation resistance gate materials in large scale integrated circuits (LSI) has become an important approach in advanced MOS process development (1). This research is a systematic study on the structure and properties of molybdenum silicide thin film and its applicability to high performance LSI fabrication.


2017 ◽  
Vol 23 (1) ◽  
pp. 87
Author(s):  
Alexander A. Shmatov ◽  
Ľubomír Šooš ◽  
Zdenko Krajný

<p class="AMSmaintext"><span lang="EN-US">The new method for hardening ready-made steels, hard alloys and diamond tools is developed: low-temperature process for producing thin-film solid lubricant coatings by hydro chemical treatment in specially prepared aqueous media of nanosized hard refractory compounds and subsequent tempering. The main advantages of the method over known processes are presented. The principles for dispersion of refractory materials are formulated. The structure and properties of the obtained coatings are examined. <br /></span></p>


2021 ◽  
pp. 3-30
Author(s):  
Fredrick Madaraka Mwema ◽  
Esther Titilayo Akinlabi ◽  
Oluseyi Philip Oladijo

1998 ◽  
Vol 27 (11) ◽  
pp. 1211-1215 ◽  
Author(s):  
J. E. Krzanowski ◽  
E. Razon ◽  
A. F. Hmiel

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