scholarly journals Laser Ablation. Ablation Using Vacuum-Ultraviolet Lasers.

1997 ◽  
Vol 25 (4) ◽  
pp. 283-287 ◽  
Author(s):  
Koji SUGIOKA ◽  
Satoshi WADA ◽  
Hideo TASHIRO ◽  
Koichi TOYODA
1991 ◽  
Vol 30 (Part 1, No. 11A) ◽  
pp. 2806-2807 ◽  
Author(s):  
Masahito Katto ◽  
Kou Kurosawa ◽  
Wataru Sasaki ◽  
Yasuo Takigawa ◽  
Masahiro Okuda

1994 ◽  
Vol 7 (2) ◽  
pp. 373-380 ◽  
Author(s):  
SHINGO INOUE ◽  
TAKEO FUJII ◽  
YOSHIAKI UENO ◽  
FUMIHITKO KANNARI

1992 ◽  
Vol 285 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
David J. Moore

ABSTRACTVacuum-ultraviolet laser ablation of Teflon is reviewed. The 157 nm irradiation of Teflon produces clean ablation sites well suited to micromachining applications in the electronics and medical fields. At 193 nm, etching profiles are poorly defined, showing swelling characteristics commonly produced by longer wavelength lasers. Comprehensive new 193 nm ablation data are presented showing the first evidence of incubation effects for Teflon. A computer model was developed to include ablation, swelling and incubation processes. The computer results satisfactorily model the experimental data over a large fluence range of 0.6 to 13 J/cm2 with three adjustable parameters.


1998 ◽  
Vol 11 (2) ◽  
pp. 367-372 ◽  
Author(s):  
Kou Kurosawa ◽  
Peter. R. Herman ◽  
Wataru Sasaki

1992 ◽  
Vol 20 (1) ◽  
pp. 11-19 ◽  
Author(s):  
Kou KUROSAWA ◽  
Wataru SASAKI ◽  
Yasuo TAKIGAWA

2002 ◽  
Vol 44 (3) ◽  
pp. 182-188
Author(s):  
Koichi KAJIHARA ◽  
Masahiro HIRANO ◽  
Hideo HOSONO

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