scholarly journals Dynamics of Plasma-Surface Interactions using In-situ Ion Beam Analysis

2009 ◽  
Author(s):  
D.G. Whyte
Keyword(s):  
Ion Beam ◽  
Surface Interactions ◽  
Ion Beam Analysis ◽  
Plasma Surface ◽  
Plasma Surface Interactions ◽  
Beam Analysis

In situ characterization of rare earth-CdTe heterostructures by ion beam analysis

1994 ◽  
Vol 249 (2) ◽  
pp. 266-270 ◽  
Author(s):  
P Gros ◽  
G Fiat ◽  
D Brun ◽  
B Daudin ◽  
J Eymery ◽  
...  
Keyword(s):  
Rare Earth ◽  
Ion Beam ◽  
In Situ Characterization ◽  
Ion Beam Analysis ◽  
Beam Analysis

IN SITU ION BEAM ANALYSIS OF CHEMICAL AND PLASMA ETCHING OF Si

2001 ◽  
Vol 15 (28n29) ◽  
pp. 1419-1427
Author(s):  
KARUR R. PADMANABHAN
Keyword(s):  
Plasma Etching ◽  
Chemical Etching ◽  
Ion Beam ◽  
Etching Rate ◽  
Surface Damage ◽  
Moderate Increase ◽  
Ion Beam Analysis ◽  
Beam Analysis ◽  
Etched Surface

The possibility of carrying out in situ ion beam analysis of a gas-solid interface using RBS/Channeling techniques has been investigated using chemical and plasma etching of Si . A specially constructed thin Si window cell is used to initiate chemical etching of Si using Xe F 2. Analysis of etched Si surface using conventional, micro RBS/Channeling and computer simulated channeling spectra indicates a smooth damage free surface with fairly uniform etching. A moderate increase in etching rate and channeling χ min is observed in the presence of the analyzing beam. The results of chemical etching are compared with that due to Ar + and Xe + plasma induced etching of Si . In situ microbeam channeling analysis with CCM (Channeling Contrast Microscopy) of the plasma-etched surface indicates distinct differences in both etching rate and damage profile of Si (100) surface. The etching rate enhancement and damage profile have been explained using conventional TRIM analysis and ion beam surface damage.

scholarly journals In situ MeV ion beam analysis of ceramic surfaces modified by 100–400 keV ion irradiation

1996 ◽  
Vol 118 (1-4) ◽  
pp. 766-771 ◽  
Author(s):  
Ning Yu ◽  
Timothy E. Levine ◽  
Kurt E. Sickafus ◽  
Michael Nastasi ◽  
Jeremy N. Mitchell ◽  
...  
Keyword(s):  
Ion Irradiation ◽  
Ion Beam ◽  
Ion Beam Analysis ◽  
Ceramic Surfaces ◽  
Beam Analysis

Study of hydrogen isotopes behavior in carbon based materials with in situ ion beam analysis under plasma exposure

2013 ◽  
Vol 438 ◽  
pp. S1036-S1039 ◽  
Author(s):  
Y. Nakamura ◽  
M. Yamagiwa ◽  
T. Kaneko ◽  
N. Matsunami ◽  
N. Ohno ◽  
...  
Keyword(s):  
Ion Beam ◽  
Hydrogen Isotopes ◽  
Plasma Exposure ◽  
Ion Beam Analysis ◽  
Beam Analysis ◽  
Carbon Based

scholarly journals In situ ion-beam analysis and modification of sol-gel zirconia thin films

1995 ◽  
Vol 106 (1-4) ◽  
pp. 597-601 ◽  
Author(s):  
T.E. Levine ◽  
N. Yu ◽  
P. Kodali ◽  
K.C. Walter ◽  
M. Nastasi ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Sol Gel ◽  
Ion Beam Analysis ◽  
Beam Analysis

scholarly journals Atmosphere influence on in-situ ion beam analysis of thin film growth

1994 ◽  
Vol 253 (1-2) ◽  
pp. 247-253 ◽  
Author(s):  
Yuping Lin ◽  
Alan R. Krauss ◽  
Robert P.H. Chang ◽  
Orlando H. Auciello ◽  
Dieter M. Gruen ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Ion Beam ◽  
Thin Film Growth ◽  
Ion Beam Analysis ◽  
Beam Analysis
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