scholarly journals X-Ray Diffuse Scattering Study of the Kinetics of Stacking Fault Growth and Annihilation in Boron-Implanted Silicon.

2002 ◽  
Author(s):  
Jamshed R Patel
Keyword(s):  
Diffuse Scattering ◽  
Stacking Fault ◽  
X Ray ◽  
Scattering Study ◽  
Fault Growth ◽  
Kinetics Of

scholarly journals X-ray diffuse scattering study of the kinetics of stacking fault growth and annihilation in boron-implanted silicon

2002 ◽  
Vol 81 (17) ◽  
pp. 3167-3169 ◽  
Author(s):  
D. Luebbert ◽  
J. Arthur ◽  
M. Sztucki ◽  
T. H. Metzger ◽  
P. B. Griffin ◽  
...  
Keyword(s):  
Diffuse Scattering ◽  
Stacking Fault ◽  
X Ray ◽  
Scattering Study ◽  
Fault Growth ◽  
Kinetics Of

Clusters and Planar Defects in Boron Implanted Silicon an X-Ray Diffuse Scattering Study

2000 ◽  
Vol 610 ◽  
Author(s):  
I. Kegel ◽  
M. Sztucki ◽  
T. H. Metzger ◽  
D. Lubbert ◽  
J. Arthur ◽  
...  
Keyword(s):  
Point Defect ◽  
Diffuse Scattering ◽  
Annealing Temperature ◽  
Grazing Incidence ◽  
Stacking Fault ◽  
Planar Defects ◽  
X Ray ◽  
Enhanced Diffusion ◽  
Integrated Intensity ◽  
Scattering Study

AbstractIn a grazing incidence x-ray diffuse scattering study of defects in boron implanted and annealed silicon we have discovered narrow rods of intensity along [111] directions. These diffuse rods of intensity arise from stacking faults formed in the early stages of annealing in the range around 1000°C. From the width of the stacking fault induced rods we can estimate their size, while the integrated intensity is a measure of the total stacking fault area in the implanted layer. Surprisingly we find that these faults initially grow in size and density and after reaching a maximum begin to dissolve and ultimately are totally annihilated. The intensity rods are distinct from the point defect or point defect cluster scattering in the tails of the Bragg peaks referred to as Huang Scattering. From the nature of the q dependence of the diffuse scattering in the Bragg tails we find unequivocal evidence for the presence of clusters in our annealed samples. The average effective size seems remarkably independent of annealing temperature. These observations will be discussed in the context of the enhanced diffusion of boron over its bulk value.

In Situ Wide- and Small-Angle X-ray Scattering Study of Melting Kinetics of Isotactic Poly(propylene)

2003 ◽  
Vol 36 (11) ◽  
pp. 4042-4050 ◽  
Author(s):  
Patrick S. Dai ◽  
Peggy Cebe ◽  
Malcolm Capel ◽  
Rufina G. Alamo ◽  
Leo Mandelkern
Keyword(s):  
Small Angle ◽  
X Ray ◽  
X Ray Scattering ◽  
Melting Kinetics ◽  
Scattering Study ◽  
Poly Propylene ◽  
Kinetics Of ◽  
Ray Scattering

A High-Energy Monochromatic Laue (MonoLaue) X-ray Diffuse Scattering Study of KMnF3 using an Image Plate

1997 ◽  
Vol 30 (1) ◽  
pp. 16-20 ◽  
Author(s):  
A. Gibaud ◽  
D. Harlow ◽  
J. B. Hastings ◽  
J. P. Hill ◽  
D. Chapman
Keyword(s):  
Diffuse Scattering ◽  
High Energy ◽  
Experimental Conditions ◽  
X Ray ◽  
Image Plate ◽  
X Ray Scattering ◽  
Scattering Study ◽  
Diffraction Patterns ◽  
Ray Scattering

The technique of high-energy monochromatic Laue X-ray scattering using image plates to record the diffraction patterns is presented. A tunable wiggler beamline is used as an X-ray source. It is shown that such experimental conditions present many advantages over conventional tube sources and photographic films. A study of diffuse scattering in the perovskite compound KMnF3 is presented to illustrate this in a qualitative way.

scholarly journals Disorder in pentachloronitrobenzene, C6Cl5NO2: a diffuse scattering study

2007 ◽  
Vol 63 (4) ◽  
pp. 663-673 ◽  
Author(s):  
Lynne H. Thomas ◽  
T. Richard Welberry ◽  
Darren J. Goossens ◽  
Aidan P. Heerdegen ◽  
Matthias J. Gutmann ◽  
...  
Keyword(s):  
Diffuse Scattering ◽  
Short Range ◽  
Scattering Data ◽  
X Ray ◽  
Monte Carlo Computer Simulation ◽  
X Ray Scattering ◽  
Scattering Study ◽  
The Mean ◽  
Diffraction Patterns ◽  
Local Relaxation

Monte Carlo computer simulation has been used to interpret and model observed single-crystal diffuse X-ray scattering data for pentachloronitrobenzene, C6Cl5NO2. Each site in the crystal contains a molecule in one of six different basic orientations with equal probability. However, no short-range order amongst these different orientations has been detected. The strong, detailed and very distinctive diffraction patterns can be accounted for almost entirely on the assumption of random occupancy of each molecular site, but with very large local relaxation displacements that tend to increase the neighbouring distances for contacts involving NO2...NO2 and NO2...Cl with a corresponding reduction for those involving Cl...Cl. The results show that the mean NO2...NO2 distance is increased by ∼ 0.6 Å, compared with that given by the average structure determination.

X-ray diffuse scattering study of G.P. zones in Al-4 at.% Zn

1989 ◽  
Vol 37 (8) ◽  
pp. 2185-2195 ◽  
Author(s):  
D.R Haeffner ◽  
J.B Cohen
Keyword(s):  
Diffuse Scattering ◽  
X Ray ◽  
Scattering Study
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