scholarly journals Characterization of the Li(Si)/CoS(2) couple for a high-voltage, high-power thermal battery

2000 ◽  
Author(s):  
RONALD A. GUIDOTTI ◽  
FREDERICK W. REINHARDT
Keyword(s):  
High Voltage ◽  
High Power ◽  
Thermal Battery

Characterization of a 808 nm High power Diode Laser module

2008 ◽  
Vol 4 (4) ◽  
pp. 1-10
Author(s):  
Ashraf. EL-Sherif ◽  
Mahmoud Hassan ◽  
Ayman Mokhtar ◽  
Ahmed Samy
Keyword(s):  
Diode Laser ◽  
High Power ◽  
Laser Module ◽  
Power Diode ◽  
High Power Diode Laser

scholarly journals High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

Materials ◽  
2021 ◽  
Vol 14 (5) ◽  
pp. 1228
Author(s):  
Marcin Winnicki ◽  
Artur Wiatrowski ◽  
Michał Mazur
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
High Voltage ◽  
High Power ◽  
Power Supply ◽  
Indium Tin Oxide ◽  
Volume Ratio ◽  
Cold Spraying ◽  
High Voltage Power Supply ◽  
Composite Target

High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.

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