scholarly journals Integrated Electrochemical Decontamination and Etching System

2020 ◽  
Author(s):  
Benjamin Karmiol
Keyword(s):  
Etching System

NOHSO4/HF – A Novel Etching System for Crystalline Silicon

2007 ◽  
Vol 62 (11) ◽  
pp. 1411-1421 ◽  
Author(s):  
Sebastian Patzig ◽  
Gerhard Roewer ◽  
Edwin Kroke ◽  
Ingo över
Keyword(s):  
Gas Phase ◽  
Chemical Etching ◽  
Silicon Surface ◽  
Crystalline Silicon ◽  
Etching Solution ◽  
Wide Range ◽  
Ft Ir ◽  
Wet Chemical ◽  
Wet Chemical Etching ◽  
Etching System

Solutions consisting of HF - NOHSO4 - H2SO4 exhibit a strong reactivity towards crystalline silicon which is controlled by the concentrations of the reactive species HF and NO+. Selective isotropic and anisotropic wet chemical etching with these solutions allows to generate a wide range of silicon surface morphology patterns. Traces of Ag+ ions stimulate the reactivity and lead to the formation of planarized (polished) silicon surfaces. Analyses of the silicon surface, the etching solution and the gas phase were performed with scanning electron microscopy (SEM), DR/FT-IR (diffusive reflection Fourier transform infra-red), FT-IR, Raman and NMR spectroscopy, respectively. It was found that the resulting silicon surface is hydrogen-terminated. The gas phase contains predominantly SiF4, NO and N2O. Furthermore, NH4+ is produced in solution. The study has confirmed the crucial role of nitrosyl ions for isotropic wet chemical etching processes. The novel etching system is proposed as an effective new way for selective surface texturing of multi- and monocrystalline silicon. A high etching bath service lifetime, besides a low contamination of the etching solution with reaction products, provides ecological and economical advantages for the semiconductor and solar industry.

Sputterimg and etching system

Vacuum ◽  
1971 ◽  
Vol 21 (3-4) ◽  
pp. 132-133
Keyword(s):  
Etching System

scholarly journals Fabrication of highly uniform nanoprobe via the automated process for tip-enhanced Raman spectroscopy

Nanophotonics ◽  
2020 ◽  
Vol 9 (9) ◽  
pp. 2989-2996
Author(s):  
Dong Hyeon Kim ◽  
Chanwoo Lee ◽  
Byeong Geun Jeong ◽  
Sung Hyuk Kim ◽  
Mun Seok Jeong
Keyword(s):  
Raman Spectroscopy ◽  
Human Error ◽  
Acidic Solution ◽  
High Spatial Resolution ◽  
Electrochemical Etching ◽  
Radius Of Curvature ◽  
Enhanced Raman Scattering ◽  
Tip Enhanced Raman Spectroscopy ◽  
Highly Uniform ◽  
Etching System

AbstractIn a tip-enhanced Raman spectroscopy (TERS) system, using a sharp nanotip that comprises a noble metal is critical to attaining high spatial resolution and highly enhanced Raman scattering. A strongly acidic solution is typically used to fabricate gold nanotips in a quick and reliable manner. However, using an acidic solution could corrode the etching system, thereby posing hazardous problems. Therefore, both the corrosion of the etching system and human error induced by the conventional method considerably decrease the quality and reproducibility of the tip. In this study, we significantly increased the reproducibility of tip fabrication by automating the electrochemical etching system. In addition, we optimized the etching conditions for an etchant that comprised a KCl solution to which ethanol was added to overcome the limitations of the acidic etchant. The automated etching system significantly increases the yield rate of tip-fabrication reproducibility from 65 to 95%. The standard deviation of the radius of curvature decreased to 7.3 nm with an average radius of curvature of 30 nm. Accordingly, the automated electrochemical etching system might improve the efficiency of TERS.

Revised electrochemical etching system for a reproducible fabrication of ultra-sharp tungsten tips

2021 ◽  
Author(s):  
Luca Bartolini ◽  
Andrea Poletti ◽  
Robert Marks ◽  
Enrico Verlato ◽  
Francesco Paolucci ◽  
...  
Keyword(s):  
Electrochemical Etching ◽  
Etching System
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